Publications 2007

  • 07_14
    Comparison of composition of ultra-thin silicon oxynitride layers fabricated by PECVD and ultrashallow rf plasma ion implantation
    R. Mroczyński, T. Bieniek, R. B. Beck, M. Ćwil, P. Konarski, P. Hoffmann, D. Schmeißer
    Journal of Telecommunications and Information Technology 3 (2007) 20-24, ISSN 1509-4553
    Online
  • 07_13
    The influence of annealing (900°C) of ultra-thin PECVD silicon oxynitride layers
    R. Mroczyński, G. Głuszko, R. B. Beck, A. Jakubowski, M. Ćwil, P. Konarski, P. Hoffmann, D. Schmeißer
    Journal of Telecommunications and Information Technology 3 (2007) 16-19, ISSN 1509-4553
    Online
  • 07_12
    Composition and electrical properties of ultra-thin SiOxNy layers formed by rf plasma nitrogen implantation/plasma oxidation processes
    T. Bieniek, R.B. Beck, A. Jakubowski, P. Konarski, M. Ćwil, P. Hoffmann, D. Schmeißer
    Journal of Telecommunications and Information Technology, 3 (2007) 9-15, ISSN 1509-4553
    Online
  • 07_11
    Study of bulk and interface defects in silicon oxide with X-ray absorption spectroscopy
    M. Tallarida, D. Schmeißer
    Materials Science and Engineering B 144 (2007) 23-26
    Online (DOI)
  • 07_10
    Dielectric buffer layer (Aluminium Oxynitride / AlON) for ultrathin high-k materials
    Y. Burkov
    In: H.T. Vierhaus (Eds.): Computer Science Reports 03/07: DEDIS NANO DAYS. S. 21-24. BTU Cottbus (2007), ISSN: 1437-7969
  • 07_09
    In-situ Atomic Layer Deposition growth of Hafnium oxide
    K. Karavaev, M. Tallarida, D. Schmeißer
    In: H.T. Vierhaus (Eds.): Computer Science Reports 03/07: DEDIS NANO DAYS. S. 13-19. BTU Cottbus (2007), ISSN: 1437-7969
  • 07_08
    Preparation and Characterization of TiO2 thin films and Cr and Co doped TiO2 thin films
    S. Müller, G. Seibold, D. Schmeißer
    In: H.T. Vierhaus (Eds.): Computer Science Reports 03/07: DEDIS NANO DAYS. S. 7-11. BTU Cottbus (2007), ISSN: 1437-7969
  • 07_07
    Influence of the substrate on the pattern formation of a surface reaction
    S. Wehner, P. Hoffmann, D. Schmeißer, H.R. Brand, J. Küppers
    AIP Conference Proceedings 913 (2007) 121-126
    Online (DOI)
  • 07_06
    Ferromagnetic Semiconducting EuO Nanorods
    M.J. Bierman, K.M. Van Heuvelen, D. Schmeißer, T.C. Brunold, S. Jin
    Advanced Materials 19 (2007) 2677-2681
    Online (DOI)
  • 07_05
    No Interfacial Layer for PEDOT Electrodes on PVDF: Characterization of Reactions at the Interface P(VDF/TrFE)/Al and P(VDF/TrFE)/PEDOT:PSS
    K. Müller, D. Mandal, D. Schmeißer
    Materials Research Society Symposium Proceedings 997 (2007) I06-02
    In Materials and Processes for Nonvolatile Memories II, edited by T. Li, Y. Fujisaki, J. M. Slaughter, D. Tsoukalas (Mater. Res. Soc. Symp. Proc. Volume 997, Warrendale, PA, 2007), 0997-I06-02.
    Online (DOI)
  • 07_04
    Organic field effect transistors with ferroelectric hysteresis
    K. Müller, K. Henkel, I. Paloumpa, D. Schmeißer
    Thin Solid Films 515 (2007) 7683 - 7687
    Online (DOI)
  • 07_03
    Al-Oxynitride Buffer Layer Facilities for PrOX/SiC Interfaces
    K. Henkel, R. Sohal, C. Schwiertz, Y. Burkov, M. Torche, D. Schmeißer
    Materials Research Society Symposium Proceedings 996 (2007) H5-23
    Online (DOI)
  • 07_02
    Synchrotron radiation x-ray photoelectron spectroscopy study on the interface chemistry of high-k PrxAl2-xO3 (x=0-2) dielectrics on TiN for dynamic random access memory applications
    T. Schroeder, G. Lupina, R. Sohal, G. Lippert, Ch. Wenger, O. Seifarth, M.Tallarida, D. Schmeißer
    Journal of Applied Physics 102 (2007) 014103
    Online (DOI)
  • 07_01
    Metallic Nickel nanorod arrays embedded into ordered block copolymer templates
    O. Seifarth, R. Krenek, I. Tokarev, Y. Burkov, A. Sidorenko, S. Minko, M. Stamm, D. Schmeißer
    Thin Solid Films 515 (2007) 6552-6556
    Online (DOI)

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