Publications 2008

  • 08_18
    Deposition of reactive and non-reactive metals on titanium dioxide - chromium and cobalt
    S. Müller, D. Schmeißer
    Students and Young Scientists Workshop "Photonics and Microsystems", 2008 International. S. 53-58. DOI: 10.1109/STYSW.2008.5164143.
    Online (DOI)
  • 08_17
    Application of r.f. plasma ultrashallow nitrogen ion implantation for pedestal oxynitride layer formation
    T. Bieniek, R.B. Beck, A. Jakubowski, P. Konarski, M. Ćwil, P. Hoffmann, D. Schmeißer
    Vacuum 82/10 (2008) 1020-1028
    Online (DOI)
  • 08_16
    Nano-scale analysis using synchrotron-radiation: Applications in the semiconductor industry
    E. Zschech, H. Geisler, J. Rinderknecht, G. Schneider, R. Spolenak, D. Schmeißer
    Current Nanoscience 4/3 (2008) 256-266
    Online
  • 08_15
    Novel Carbon-cage based ultralow-k materials: Modelling and first experiments
    K. Zagorodniy, D. Chumakov, C. Täschner, A. Lukowiak, H. Stegmann, D. Schmeisser, H. Geisler, H.J. Engelmann, H. Hermann, E. Zschech
    IEEE Transaction on Semiconductor Manufacturing 21/4 (2008) 646-660
    Online (DOI)
  • 08_14
    Study of silicon/oxides interfaces by means of Si2O resonant photoemission
    M. Tallarida, D. Schmeißer
    Thin Solid Films 517/1 (2008) 447-449
    Online (DOI)
  • 08_13
    The initial atomic layer deposition of HfO2/Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy
    M. Tallarida, K. Karavaev, D. Schmeißer
    Journal of Applied Physics 104 (2008) 064116
    Online (DOI)
  • 08_12
    Ferroelectric properties of spin-coated ultrathin (down to 10 nm) copolymer films
    K. Müller, D. Mandal, K. Henkel, I. Paloumpa, D. Schmeißer
    Applied Physics Letters 93 (2008) 112901
    Online (DOI)
  • 08_11
    Nanosized superparamagnetic precipitates in cobalt-doped ZnO
    M. Opel, K.-W. Nielsen, S. Bauer, S.T.B. Goennenwein, J.C. Cezar, D. Schmeißer, J. Simon, W. Mader, R. Gross
    The European Physical Journal B 63 (2008) 437-444
    Online (DOI)
  • 08_10
    Properties of Cr deposited on TiO2 thin films
    S. Müller, D. Schmeißer
    BESSY annual report 2007, pp. 433-434
  • 08_09
    Interface chemistry of high-k PrxAl2-xO3 (x=0-2) dielectrics on TiN for dynamic random access memory applications
    R. Sohal, G. Lupina, G. Lippert, C. Wenger, O. Seifarth, T. Schroeder, M. Tallarida, D. Schmeißer
    BESSY annual report 2007, pp. 197-198
  • 08_08
    HfO2 ALD-growth studied by in situ photoemission
    M. Tallarida, K. Karavaev, D. Schmeißer, E. Zschech
    Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 289-290
  • 08_07
    Band gap and electronic structure determination with XAS and UPS of thin Pr-oxide films on Si (111)
    O. Seifarth, A. Wilke, C. Walczyk, J. Dabrowski, P. Zaumseil, D. Schmeißer, H.-J. Müssig, T. Schroeder
    Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 285-286
  • 08_06
    Al-Oxynitride as a buffer layer for high-k dielectrics
    K. Henkel, Y. Burkov, M. Bergholz, K. Karavaev, R. Sohal, M. Torche, D. Schmeißer
    Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 161-162
  • 08_05
    Electrical investigations on MFIS structures consisting P[VDF/TrFE] as ferro-electric layer for non-volatile memory applications
    K. Henkel, D. Mandal, B. Seime, I. Paloumpa, I. Lazareva, K. Müller, P. Müller, D. Schmeißer
    Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 159-160
  • 08_04
    Influence of annealing on the structure and stoichiometry of europium-doped titanium dioxide thin films
    J. Domaradzki, D. Kaczmarek, A. Borkowska, D. Schmeißer, S. Müller, R. Wasielewski, A. Ciszewski, D. Wojcieszak
    Vacuum 82 (2008) 1007-1012
    Online (DOI)
  • 08_03
    Soft X-ray emission electron microscopy: chemical state microscopy from interface and bulk
    A. Zimina, D. R. Batchelor, S. Eisebitt, D. Schmeißer, A. Shulakov, W. Eberhardt
    Surface and Interface Analysis 40 (2008) 958-960
    Online (DOI)
  • 08_02
    Al-Oxyxynitride interfacial layer investigations for PrXOY on SiC and Si
    K. Henkel, K. Karavaev, M. Torche, C. Schwiertz, Y. Burkov, D. Schmeißer
    Journal of Physics: Conference Series 94 (2008) 012004
    Online (DOI)
  • 08_01
    Microscopic and spectroscopic characterization of interfaces and dielectric layers for OFET devices
    K. Müller, Y. Burkov, D. Mandal, K. Henkel, I. Paloumpa, A. Goryachko, D. Schmeißer
    Physica Status Solidi A 205/3 (2008) 600-611
    Online (DOI)

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