Publications 2010

  • 10_17
    Localized Gap States in LiCoO2 and their Influence on the Transport Properties in Li-Ion Batteries
    D. Schmeißer, S. Schmidt, G. Seibold, G. Cherkashinin, W. Jaegermann
    ECS Transactions 25/35 (2010) 37-45, ISSN 1938-5862
    Online (DOI), ISSN 1938-6737
  • 10_16
    Atomic layer deposition of HfO2 investigated in situ by means of a noncontact atomic force microscopy
    K. Kolanek, M. Tallarida, D. Schmeißer
    Materials Science Poland 28/3 (2010) 731-740
  • 10_15
    Determination of interfacial layers in high-k nanomaterials by ADXPS measurements
    J. Wyrodek, M. Tallarida, M. Weisheit, D. Schmeißer
    Students and Young Scientists Workshop "Photonics and Microsystems", 2010 International. S. 89-92. DOI: 10.1109/STYSW.2010.5714180.
    Online (DOI)
  • 10_14
    Band alignment of high-k/SiO2/Si stacks incorporating Zr and Al oxides prepared by atomic layer deposition
    Ł. Starzyk, M. Tallarida, D. Schmeißer
    Students and Young Scientists Workshop "Photonics and Microsystems", 2010 International. S. 75-78. DOI: 10.1109/STYSW.2010.5714175.
    Online (DOI)
  • 10_13
    Fullerene based materials for ultra-low-k application
    K. Broczkowska, J. Klocek, D. Friedrich, K. Henkel, K. Kolanek, A. Urbanowicz, D. Schmeißer, M. Miller, E. Zschech
    Students and Young Scientists Workshop "Photonics and Microsystems", 2010 International. S. 39-43. DOI: 10.1109/STYSW.2010.5714165.
    Online (DOI)
  • 10_12
    Single crystalline Pr2-xYxO3 (x=0-2) dielectrics on Si with tailored electronic and crystallographic structure
    O. Seifarth, M. A. Schubert, A. Giussani, D. O. Klenov, D. Schmeißer, T. Schroeder
    Journal of Applied Physics 108 (2010) 103709
    Online (DOI)
  • 10_11
    Band gap determination of P(VDF-TrFE) copolymer film by electron energy loss spectroscopy
    D. Mandal, K. Henkel, K. Müller, D. Schmeißer
    Bulletin of Materials Science 33/4 (2010) 457-461
    Online (DOI)
  • 10_10
    ALD on high mobility channels: engineering the proper gate stack passivation
    S. Sioncke, H.C. Lin, C. Adelmann, G. Brammertz, A. Delabie, T. Conard, A. Franquet, M. Caymax, M. Meuris,H. Struyf, S. De Gendt, M. Heyns, C. Fleischmann, K. Temst, A. Vantomme, M. Müller, M. Kolbe, B. Beckhoff, D. Schmeisser, M. Tallarida
    ECS Transactions 33/2 (2010) 9-23, ISSN 1938-5862
    Online (DOI), ISSN 1938-6737
  • 10_09
    Local anodic oxidation by atomic force microscopy for nano-Raman strain measurements on silicon-germanium thin films
    K. Kolanek, P. Hermann, P.T. Dudek, T. Gotszalk, D. Chumakov, M. Weisheit, M. Hecker, E. Zschech
    Thin Solid Films 518 (2010) 3267-3272
    Online (DOI)
  • 10_08
    Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films
    A. Tamm, M. Kemell, J. Kozlova, T. Sajavaara, M. Tallarida, K. Kukli, V. Sammelselg, M. Ritala, M. Leskelä
    Journal of The Electrochemical Society 157 (2010) G193-G201
    Online (DOI)
  • 10_07
    Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1'-methyl-ruthenocene
    K. Kukli, J. Aarik, A. Aidla, T. Uustare, I. Jogi, J. Lu, M. Tallarida, M. Kemell A.A. Kiisler, M. Ritala, M. Leskela
    Journal of Crystal Growth 312 (2010) 2025-2032
    Online (DOI)
  • 10_06
    In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope
    K. Kolanek, M. Tallarida, K. Karavaev, D. Schmeißer
    Thin Solid Films 518 (2010) 4688-4691
    Online (DOI)
  • 10_05
    Scaling effects on microstructure and reliability for Cu interconnects
    P. S. Ho, E. Zschech, D. Schmeißer, M. A. Meyer, R. Huebner, M. Hauschildt, L. Zhang. M. Gall, M. Kraatz
    International Journal Materials Research 101/2 (2010) 216-227
    Online (DOI)
  • 10_04
    Optimization of MFIS structures containing poly(vinylidene-fluoride trifluoroethylene) for non-volatile memory applications
    K. Henkel, B. Seime, I. Paloumpa, K. Müller, D. Schmeißer
    Materials Science Poland 28/1 (2010) 117-128
  • 10_03
    Stochastic aspects of pattern formation during the catalytic oxidation of CO on Pd(111) surfaces
    S. Wehner, S. Karpitschka, Y. Burkov, D. Schmeißer, J. Küppers, H. R. Brand
    Physica D 239 (2010) 746-751
    Online (DOI)
  • 10_02
    Buffer layer investigations on MFIS capacitors consisting of ferroelectric poly[vinylidene fluoride trifluoroethylene]
    K. Henkel, B. Seime, I. Paloumpa, K. Müller, D. Schmeißer
    IOP conference series: Materials Science and Engineering 8 (2010) 012036
    Online (DOI)
  • 10_01
    The band gap and band offset in ultrathin oxide-semiconductor heterostructures
    D. Schmeißer, K. Henkel, M. Bergholz, M. Tallarida
    Superlattices and Microstructures 47 (2010) 369-376
    Online (DOI) 

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