Paper published in »JVSTA« and selected as »Editor's Pick«
A. Mahmoodinezhad, C. Janowitz, F. Naumann, P. Plate, H. Gargouri, K. Henkel, D. Schmeißer, J. I. Flege
Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Journal of Vacuum Science and Technology A, 38 (2020) 022404
Online (DOI)
This article may be downloaded here for personal use only. Any other use requires prior permission of the author and AIP Publishing.
Contact
Angewandte Physik und Halbleiterspektroskopie
T +49 (0) 355 69-5354
karsten.henkel(at)b-tu.de
Angewandte Physik und Halbleiterspektroskopie
T +49 (0) 355 69-5352
flege(at)b-tu.de

