Paper published in »Journal of Vacuum Science and Technology A« - Chair of Applied Physics and Semiconductor Spectroscopy

A manuscript with co-authors from »IHP Leibniz-Instituts für innovative Mikroelektronik« and »SENTECH Instruments GmbH« has been published in the »Journal of Vacuum Science and Technology A«.

A. Mahmoodinezhad, C. Morales, F. Naumann, P. Plate, R. Meyer, C. Janowitz, K. Henkel, M. Kot, M. H. Zoellner, C. Wenger, J. I. Flege
Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma
Journal of Vacuum Science and Technology A 39 (2021) 062406
Online (DOI)

Contact person

Dr.-Ing. Karsten Henkel
Angewandte Physik und Halbleiterspektroskopie
T +49 (0) 355 69-5354
karsten.henkel(at)b-tu.de

Prof. Dr. rer. nat. habil. Ingo Flege
Angewandte Physik und Halbleiterspektroskopie
T +49 (0) 355 69-5352
flege(at)b-tu.de

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