Habilitation, PhD, Diploma theses

• [T3]
  J. I. Flege, In situ studies on growth, structure, and chemical reactivity of transition metal and rare-earth oxide surfaces (written in German), Habilitation Thesis, University of Bremen, Germany, 2016.

• [T2]
  J. I. Flege, Characterization of the photon-stimulated desorption of halogenated silicon surfaces with x-ray standing waves (written in German), Doctoral Dissertation (Dr. rer. nat.), University of Hamburg, Germany, 2004.

• [T1]
  J. I. Flege, Investigation of the photon-stimulated desorption of chlorine on silicon(111) with x-ray standing waves (written in German), Diploma Thesis, University of Hamburg, Germany, 2000.

Book chapters

• [B4]
  D. C. Grinter and J. I. Flege*, Characterization of ultrathin oxide films by low-energy and photoemission electron microscopy, in Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry, K. Wandelt (ed.), vol. 3, pp 49-61 (2018).
  Online (DOI)

• [B3]
  M. Siebert, Th. Schmidt, J. I. Flege, and J. Falta, in The X-Ray Standing Wave Technique: Principles and Applications (edited by J. Zegenhagen and A. Kazimirov), Chap. Combining x-ray standing waves and density functional theory, World Scientific, Singapore(2013).

• [B2]
  J. I. Flege, Th. Schmidt, A. Hille, J. Falta, and G. Materlik, in The X-Ray Standing Wave Technique: Principles and Applications (edited by J. Zegenhagen and A. Kazimirov), Chap. Photon stimulated desorption, World Scientific,Singapore(2013).

• [B1]
  J. I. Flege, W.-X. Tang, and M. S. Altman, Low-energy electron microscopy, in: E. N. Kaufmann (ed.), Characterization of Materials, 2^nd edition, John Wiley & Sons, Hoboken, New Jersey, United States (2012).

Publications in 'peer-review' journals
(* = corresponding author)

2018

• [81]
  J. I. Flege*, J. Höcker, J. T. Sadowski, S. D. Senanayake, and J. Falta, Nucleation, morphology, and structure of sub-nm thin ceria islands on Rh(111), Surf. Interf. Anal., in press. DOI: 10.1002/sia.6567
  Online (DOI)

• [80]
  A. Schaefer, B. Hagman, J. Höcker, U. Hejral, J. I. Flege, and J. Gustafson, Thermal reduction of ceria nanostructures on rhodium(111) and re-oxidation by CO₂, Phys. Chem. Chem. Phys. 20, 19447 (2018).
  Online (DOI)

• [79]
  J. I. Flege* and D. C. Grinter, In situ studies of oxide nucleation, growth, and transformation using slow electrons, Prog. Surf. Sci. 93, 21(2018). (invited review article)
  Online (DOI)

2017

• [78]
  T. Duchoň, J. Hackl, J. Höcker, K. Veltruská, V. Matolín, J. Falta, S. Cramm, S. Nemšák, C. M. Schneider, J. I. Flege, and S. D. Senanayake, Exploiting micro-scale structural and chemical observations in real time for understanding chemical conversion: LEEM/PEEM studies over CeO_x-Cu(111), Ultramicroscopy 183, 84 (2017).
  Online (DOI)

• [77]
  J. I. Flege*, J.-O. Krisponeit, J. Höcker, M. Hoppe, Y. Niu, A. Zakharov, A. Schaefer, E. E. Krasovskii, and J. Falta, Nanoscale analysis of oxidation state and surface termination of praseodymium oxide ultrathin films on ruthenium(0001), Ultramicroscopy 183, 61 (2017).
  Online (DOI)

• [76]
  J. Höcker, J.-O. Krisponeit, Th. Schmidt, J. Falta, and J. I. Flege*, The cubic-to-hexagonal phase transition of cerium oxide particles: dynamics and structure,Nanoscale 9, 9352 (2017).
  Online (DOI)

• [75]
  M. Speckmann, Th. Schmidt, J. I. Flege, J. Höcker, I. Heidmann, and J. Falta, Ga and In adsorption on Si(112): adsorption sites and superstructure, Phys. Rev. B 95, 125441 (2017).
  Online (DOI)

• [74]
  J. Höcker, J.-O. Krisponeit, J. Cambeis, A. Zakharov, Y. Niu, G. Wei, L. Colombi Ciacchi, J. Falta, A. Schaefer, and J. I. Flege*, Growth and structure of ultrathin praseodymium oxide layers on Ruthenium(0001), Phys. Chem. Chem. Phys. 19, 3480 (2017). (journal inside cover)
  Online (DOI)

• [73]
  S. Förster, J. I. Flege, E. M. Zollner, F. O. Schumann, R. Hammer, A. Bayat, K.-M. Schindler, J. Falta, and W. Widdra, Growth and decay of a two-dimensional oxide quasicrystal: High-temperature in situ microscopy,Ann. Phys. (Berlin) 529, 1600250 (2017). (Editor’s choice, journal front cover)
  Online (DOI)

• [72]
  M. Sauerbrey, G. Gasperi, P. Luches, J. Falta, S. Valeri, and J. I. Flege*,
  Cerium oxide epitaxial nanostructures on Pt(111): growth, morphology and structure, Top. Catal. 60, 513 (2017).
  Online (DOI)

2016

• [71]
  Th. Schmidt, M. Speckmann, J. I. Flege, K. Müller-Caspary, I. Heidmann, A. Kubelka, T. O. Menteş, M. Á. Niño, A. Locatelli, A. Rosenauer, and J. Falta, Mazes and meso-islands: the impact of Ag pre-adsorption on Ge growth on Si(111),Phys. Rev. B 94, 235410 (2016).
  Online (DOI)

• [70]
  M. Sauerbrey, J. Höcker, M. Wellbrock, M. Schowalter, J.-O. Krisponeit, K. Müller-Caspary, A. Rosenauer, G. Wei, L. Colombi Ciacchi, J. Falta, and J. I. Flege*, Ultrasmooth Ru(0001) films as templates for ceria nanoarchitectures, Cryst. Growth Des. 16, 4216(2016).
  Online (DOI)

• [69]
  Ch. Ahrens, J. I. Flege, C. Jaye, D. A. Fischer, Th. Schmidt, and J. Falta, Isotropic thin PTCDA films on GaN(0001), J. Phys.: Condens. Matter 28, 475003 (2016). (featured on journal website as “lab talk article” on Nov 10^th, 2016)
  Online (DOI)

• [68]
  M. Ewert, Th. Schmidt, J. I. Flege, I. Heidmann, T. Grzela, W. Klesse, M. Foerster, L. Aballe, T. Schroeder, and J. Falta, Morphology and chemical composition of cobalt germanide islands on Ge(001), Nanotechnology 27, 325705 (2016).
  Online (DOI)

• [67]
  D. C. Grinter, S. D. Senanayake, and J. I. Flege*, In situ growth, structure, and real-time chemical reactivity of well-defined CeO_x-Ru(0001) model surfaces, Appl. Catal. B: Environmental 197, 286 (2016).
  Online (DOI)

• [66]
  J. I. Flege*, J. Höcker, B. Kaemena, T. O. Menteş, A. Sala, A. Locatelli, S. Gangopadhyay, J. T. Sadowski, S. D. Senanayake, and J. Falta, Growth and characterization of epitaxially stabilized ceria(001) nanostructures on Ru(0001), Nanoscale 8, 10849 (2016).
  Online (DOI)

• [65]
  J. Höcker, T. Duchoň, K. Veltruská, J. Falta, V. Matolín, S. D. Senanayake*, and J. I. Flege*, Controlling Heteroepitaxy by Oxygen Chemical Potential: Exclusive Growth of (100) Oriented Ceria Nanostructures on Cu(111),J. Phys. Chem. C 120, 4895 (2016). (journal cover from Mar 10^th 2016)
  Online (DOI)

• [64]
  J. I. Flege*, J. Lachnitt, D. Mazur, P. Sutter, and J. Falta, Role of RuO₂(100) in surface oxidation and CO oxidation catalysis on Ru(0001), Phys. Chem. Chem. Phys. 18, 213 (2016).
  Online (DOI)

2015

• [63]
  J. Höcker, T. O. Menteş, A. Sala, A. Locatelli, Th. Schmidt, J. Falta, S. D. Senanayake, and J. I. Flege*, Unraveling the dynamic nanoscale reducibility (Ce⁴⁺ → Ce³⁺) of CeO_x-Ru in hydrogen activation, Adv. Mater. Interfaces 2, 1500314 (2015). (journal inside cover)
  Online (DOI)

• [62]
  J. I. Flege*, B. Herd, J. Goritzka, H. Over, E. E. Krasovskii, and J. Falta, Nanoscale origin of mesoscale roughening: real-time tracking and identification of three ruthenium oxide phases in ruthenium oxidation, ACS Nano 9, 8468 (2015).
  Online (DOI)

• [61]
  J. Höcker, W. Cartas, A. Schaefer, M. Bäumer, J. Weaver, J. Falta, and J. I. Flege*, Growth, structure, and stability of the high-index TbO_x(112) surface on Cu(111), J. Phys. Chem. C 119, 14175 (2015).
  Online (DOI)

• [60]
  J. C. Goritzka, B. Herd, P. P. T. Krause, J. Falta, J. I. Flege, and H. Over, Insights into the gas phase oxidation of Ru(0001) on the mesoscopic scale using molecular oxygen, Phys. Chem. Chem. Phys. 17, 13895 (2015).
  Online (DOI)

• [59]
  A. Allahgholi, J. I. Flege*, S. Thieß, W. Drube, and J. Falta, Oxidation state analysis of ceria by XPS, ChemPhysChem 16, 1083 (2015).
  Online (DOI)

• [58]
  E. E. Krasovskii, J. Höcker, J. Falta, and J. I. Flege*, Surface resonances in electron reflection from overlayers, J. Phys.: Condens. Matter 27, 035501 (2015).
  Online (DOI)

2014

• [57]
  J. I. Flege* and E. E. Krasovskii, Intensity-voltage low-energy electron microscopy for functional materials characterization, Phys. Status Solidi RRL 8, 463 (2014). (Invited review article, front cover)
  Online (DOI)

• [56]
  J. I. Flege*, B. Kaemena, Th. Schmidt, and J. Falta, Epitaxial, well-ordered ceria/lanthana high-k gate dielectrics on silicon, J. Vac. Sci. Technol. B 32, 03D124 (2014).
  Online (DOI)

• [55]
  J. I. Flege*, B. Kaemena, J. Höcker, F. Bertram, J. Wollschläger, Th. Schmidt, and J. Falta, Ultrathin, epitaxial cerium dioxide on silicon, Appl. Phys. Lett. 104, 131604 (2014).
  Online (DOI)

2013

• [54]
  J. I. Flege*, B. Kaemena, A. Meyer, J. Falta, S. D. Senanayake, J. T. Sadowski, R. D. Eithiraj, and E. E. Krasovskii, Origin of chemical contrast in low-energy electron reflectivity of correlated multivalent oxides: the case of ceria, Phys. Rev. B 88, 235428 (2013).
  Online (DOI)

• [53]
  J. I. Flege*, B. Kaemena, S. D. Senanayake, J. Höcker, J. T. Sadowski, and J. Falta, Growth mode and oxidation state analysis of individual cerium oxide islands on ruthenium(0001), Ultramicroscopy 130, 87-93 (2013).
  Online (DOI)

• [52]
  S. Watcharinyanon, L. I. Johansson, C. Xia, J. I. Flege, A. Meyer, J. Falta, C. Virojanadara, Ytterbium intercalation of epitaxial graphene grown on Si-face SiC, Graphene2, 66 (2013).
  Online (DOI)

• [51]
  J. Hassan, A. Meyer, S. Cakmakyapan, Ozgur Kazar, J. I. Flege, J. Falta, E. Ozbay, and E. Janzén, Surface evolution of 4H-SiC(0001) during in-situ surface preparation and its influence on graphene properties, Proceedings of Silicon Carbide and Related Materials, Materials Science Forum 740-742, 157-160 (2013).
  Online (DOI)

• [50]
  B. Kaemena, S. D. Senanayake, A. Meyer, J. T. Sadowski, J. Falta, and J. I. Flege*, Growth and morphology of ceria on ruthenium(0001), J. Phys. Chem. C 117, 221 (2013).
  Online (DOI)

2012

• [49]
  J. Hassan, C. Virojanadara, A. Meyer, I. G. Ivanov, J. I. Flege, S. Watcharinyanon, J. Falta, L. I. Johansson, E. Janzén, Control of epitaxial graphene thickness on 4H-SiC(0001) and buffer layer removal through hydrogen intercalation, Proceedings of Silicon Carbide and Related Materials, Materials Science Forum 717-720, 605-608 (2012).
  Online (DOI)

• [48]
  S. D. Senanayake, J. T. Sadowski, F. Yang, J. Evans, S. Kundu, S. Agnoli, D. Stacchiola, J. I. Flege, J. Hrbek, J. A. Rodriguez, Nanopatterning in CeO_x/Cu(111): A New Mechanism for Surface Reconstruction and Enhancement of Catalytic Activity, J. Phys. Chem. Lett. 3, 839 (2012).
  Online (DOI)

2011

• [47]
  Ch. Schulz, S. Kuhr, H. Geffers, Th. Schmidt, J. I. Flege, T. Aschenbrenner, D. Hommel, and J. Falta, Cleaning of GaN(-2110) surfaces, J. Vac. Sci. Technol. A 29, 011013 (2011).
  Online (DOI)

• [46]
  J. I. Flege*, B. Kaemena, S. Gevers, F. Bertram, T. Wilkens, D. Bruns, J. Wollschläger, and J. Falta, Silicate-free growth of high-quality ultra-thin cerium oxide films on Si(111), Phys. Rev. B 84, 235418 (2011).
  Online (DOI)

• [45]
  J. I. Flege*, A. Meyer, J. Falta, and E. E. Krasovskii, Self-limited oxide formation in Ni(111) oxidation, Phys. Rev. B 84, 115441 (2011).
  Online (DOI)

• [44]
  Th. Schmidt, M. Siebert, J. I. Flege, S. Figge, S. Gangopadhyay, A. Pretorius, T.-L. Lee, J. Zegenhagen, L. Gregoratti, A. Barinov, A. Rosenauer, D. Hommel, and J. Falta, Mg and Si dopant incorporation and segregation in GaN, Phys. Status Solidi B248, 1810 (2011).
  Online (DOI)

• [43]
  J. Falta, Th. Schmidt, S. Gangopadhyay, Chr. Schulz, S. Kuhr, N. Berner, J. I. Flege, A. Pretorius, A. Rosenauer, K. Sebald, H. Lohmeyer, J. Gutowski, S. Figge, T. Yamaguchi, and D. Hommel, Cleaning and growth morphology of GaN and InGaN surfaces, Phys. Status Solidi B 248, 1800 (2011).
  Online (DOI)

• [42]
  R. E. Rettew, A. Meyer, S. D. Senanayake, T.-L. Chen, C. Petersburg, J. I. Flege, J. Falta, and F. M. Alamgir, Interactions of oxygen and ethylene with submonolayer Ag films supported on Ni(111), Phys. Chem. Chem. Phys. 13, 11034 (2011).
  Online (DOI)

• [41]
  M. Speckmann, Th. Schmidt, J. I. Flege, and J. Falta, In adsorption on Si(112) and its impact on Ge growth, IBM J. Res. Dev. 55, 11 (2011).
  Online (DOI)

• [40]
  A. Meyer, J. I. Flege*, S. D. Senanayake, B. Kaemena, R. E. Rettew, F. M. Alamgir, and Jens Falta, In-situ oxidation of ultrathin silver films on Ni(111), IBM J. Res. Dev. 55, 8 (2011).
  Online (DOI)

• [39]
  J. Falta, Th. Schmidt, S. Gangopadhyay, T. Clausen, O. Brunke, J. I. Flege, S. Heun, S. Bernstorff, L. Gregoratti, and M. Kiskinova, Ultra-thin high-quality silicon nitride films on Si(111), Eur. Phys. Lett.94, 16003 (2011).
  Online (DOI)

• [38]
  M. Minnermann, S. Pokhrel, K. Thiel, T. Laurus, A. Zargham, J. I. Flege, V. Zielasek, E. Piskorska-Hommel, J. Falta, L. Mädler, and M. Bäumer, Role of palladium in iron based Fischer-Tropsch catalysts prepared by flame spray pyrolysis, J. Phys. Chem. C115, 1302 (2011).
  Online (DOI)

2010

• [37]
  S. Gevers, J. I. Flege, B. Kaemena, D. Bruns, T. Weisemöller, J. Falta, and J. Wollschläger, Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation, Appl. Phys. Lett. 97, 242901 (2010).
  Online (DOI)

• [36]
  A. Meyer, J. I. Flege*, R. E. Rettew, S. D. Senanayake, Th. Schmidt, F. M. Alamgir, and J. Falta, Ultrathin silver films on Ni(111), Phys. Rev. B 82, 085424 (2010).
  Online (DOI)

• [35]
  A. Zargham, Th. Schmidt, J. I. Flege, M. Sauerbrey, R. Hildebrand, S. Röhe, M. Bäumer, and J. Falta, On revealing the vertical structure of nanoparticle films with elemental resolution: a total external reflection x-ray standing waves study, Nucl. Instrum. Meth. in Phys. Res. B268, 325 (2010).
  Online (DOI)

2009

• [34]
  J. I. Flege* and P. Sutter, Nanoscale analysis of Ru(0001) oxidation using low-energy and photoemission electron microscopy, J. Phys.: Condens. Matter 21, 314018 (2009).
  Online (DOI)

• [33]
  M. Speckmann, Th. Schmidt, J. I. Flege, J. Sadowski, P. Sutter, and J. Falta, Temperature dependent low energy electron microscopy study of Ge island growth on bare and Ga-terminated Si(112), J. Phys.: Condens. Matter 21, 314020 (2009).
  Online (DOI)

• [32]
  Th. Schmidt, J. I. Flege, M. Speckmann, T. Clausen, S. Gangopadhyay, A. Locatelli, T. O. Mentes, S. Heun, F. Z. Guo, P. Sutter, and J. Falta, From nanoislands to nanowires: growth of germanium on gallium terminated silicon surfaces, Phys. Stat. Sol. (a) 206, 1718 (2009).
  Online (DOI)

• [31]
  Ch. Schulz, Th. Schmidt, J. I. Flege, N. Berner, Ch. Tessarek, D. Hommel, and J. Falta, Oxide removal from GaN(0001), Phys. Stat. Sol. (c) 6, S305 (2009).
  Online (DOI)

• [30]
  Th. Schmidt, M. Siebert, J. I. Flege, S. Figge, T. Yamaguchi, D. Hommel, and J. Falta, Low-temperature growth of InGaN/GaN nano-islands investigated by grazing-incidence x-ray diffraction, Phys. Stat. Sol. (c)6, S602 (2009).
  Online (DOI)

2008

• [29]
  J. I. Flege and P. Sutter, In-Situ Structural Imaging of CO Oxidation Catalysis on oxidized Rh(111), Phys. Rev. B 78, 153402 (2008).
  Online (DOI)

• [28]
  J. I. Flege, J. Hrbek, and P. Sutter, Structural imaging of surface oxidation and oxidation catalysis on Ru(0001), Phys. Rev. B78, 165407 (2008).
  Online (DOI)

• [27]
  J. I. Flege*, Th. Schmidt, M. Siebert, G. Materlik and J. Falta, Atomic structure of chlorinated Si(113) surfaces,Phys. Rev. B 78, 085317 (2008).
  Online (DOI)

• [26]
  B. Gehl, J. I. Flege, V. Aleksandrovic, Th. Schmidt, A. Kornowski, S. Bernstorff, J. Falta, H. Weller, and M. Bäumer, Plasma modification of CoPt₃ nanoparticle arrays – a route to catalytic coatings of surfaces, J. Vac. Sci. Technol. A 26, 908 (2008).
  Online (DOI)

• [25]
  P. Sutter, J. I. Flege, and E. Sutter, Epitaxial graphene on ruthenium, Nature Mater. 7, 406 (2008).
  Online (DOI)

• [24]
  B. Gehl, A. Frömsdorf, V. Aleksandrovic, Th. Schmidt, A. Pretorius, J. I. Flege, S. Bernstorff, A. Rosenauer, J. Falta, H. Weller, and M. Bäumer, Structural and chemical effects of plasma treatment on close-packed colloidal nanoparticle layers, Adv. Funct. Mater. 18, 2398 (2008).
  Online (DOI)

2007

• [23]
  Th. Schmidt, T. Clausen, J. I. Flege, S. Gangopadhyay, A. Locatelli, T. O. Mentes, F. Z. Guo, S. Heun, and J. Falta, Adsorbate-induced self-ordering of germanium nanoislands on Si(113), New J. Phys. 9, 392 (2007).
  Online (DOI)

• [22]
  P. A. Bennett, J. Chobanian, J. I. Flege, E. Sutter, and P. Sutter, Surface thermomigration of nanoscale Pt-Si droplets on stepped Si(100), Phys. Rev. B 76, 125410 (2007).
  Online (DOI)

• [21]
  P. Sutter, P. A. Bennett, J. I. Flege, and E. Sutter, Steering Liquid Pt-Si Nanodroplets on Si(100) by Interaction with Surface Steps, Phys. Rev. Lett. 99, 125504 (2007).
  Online (DOI)

• [20]
  J. I. Flege*, E. Vescovo, G. Nintzel, L. H. Lewis, S. Hulbert, and P. Sutter, A new soft x-ray photoemission microscopy beamline at the National Synchrotron Light Source, Nucl. Instr. Meth. in Phys. Res. B 261, 855 (2007).
  Online (DOI)

• [19]
  Th. Schmidt, J. I. Flege, S. Gangopadhyay, T. Clausen, A. Locatelli, S. Heun, and J. Falta, Alignment of Ge nano-islands on Si(111) by Ga-induced substrate self-patterning, Phys. Rev. Lett. 98, 066104 (2007). [also selected for Vir. J. Nan. Sci. & Tech. 15 (8), 2007]
  Online (DOI)

2006

• [18]
  M. Siebert, Th. Schmidt, J. I. Flege, S. Einfeldt, S. Figge, D. Hommel, and J. Falta, Structural investigations of GaN films with x-ray standing waves, Phys. Stat. Sol. (c) 3, 1729 (2006).
  Online (DOI)

• [17]
  Th. Schmidt, M. Siebert, J. I. Flege, S. Gangopadhyay, A. Pretorius, R. Kröger, S. Figge, L. Gregoratti, A. Barinov, D. Hommel, and J. Falta, Surface segregation of Si and Mg dopants in MOVPE grown GaN films revealed by x-ray photoemission spectro-microscopy, Phys. Stat. Sol. (c) 3, 1725 (2006).
  Online (DOI)

• [16]
  Th. Schmidt, R. Kröger, J. I. Flege, T. Clausen, J. Falta, A. Janzen, P. Zahl, M. Kammler, and M. Horn-von Hoegen, Less strain energy despite fewer dislocations: The impact of ordering, Phys. Rev. Lett. 96, 066101 (2006).
  Online (DOI)

• [15]
  T. Clausen, Th. Schmidt, J. I. Flege, A. Locatelli, S. Heun, O. T. Mentes, F. Guo, and J. Falta, Temperature dependent low energy electron microscopy study of Ge growth on Si(113), Appl. Surf. Sci. 252, 5321 (2006).
  Online (DOI)

• [14]
  Th. Schmidt, M. Siebert, A. Pretorius, S. Gangopadhyay, S. Figge, J. I. Flege, L. Gregoratti, A. Barinov, D. Hommel, and J. Falta, Spectro-microscopy on Si doped GaN films, Nucl. Instr. Meth. in Phys. Res. B 246, 79 (2006).
  Online (DOI)

• [13]
  J. I. Flege*, Th. Schmidt, G. Alexe, T. Clausen, S. Bernstorff, I. Randjelovic, V. Aleksandrovic, A. Kornowski, H. Weller, and J. Falta, Grazing-incidence small-angle x-ray scattering investigation of spin-coated CoPt₃ nanoparticle films, Nucl. Instr. Meth. in Phys. Res. B 246, 25 (2006).
  Online (DOI)

• [12]
  M. Siebert, Th. Schmidt, J. I. Flege, J. Zegenhagen, T.-L. Lee, S. Figge, D. Hommel, and J. Falta, X-ray standing wave investigations of Si dopant incorporation in GaN, Proc. Mat. Res. Soc. Symp. 892, FF03-03.1 (2006).
  Online (DOI)

• [11]
  T. Clausen, J. I. Flege, Th. Schmidt, and J. Falta, Sb surfactant-mediated epitaxy of Ge on Si(113) studied by AFM, SEM and GIXRD, Proc. Mat. Res. Soc. Symp. 901E, Ra12-06.1 (2006).
  Online (DOI)

2005

• [10]
  T. Clausen, Th. Schmidt, J. I. Flege, A. Locatelli, S. Heun, O. T. Mentes, F. Z. Guo, and J. Falta, Real-time low-energy electron microscopy study of Ga adsorption and facet array formation on Si(113), e-J. Surf. Sci. Nanotech. Vol. 3, 379 (2005).
  Online (DOI)

• [9]
  Th. Schmidt, E. Roventa, T. Clausen, J. I. Flege, G. Alexe, S. Bernstorff, C. Kübel, A. Rosenauer, D. Hommel, and J. Falta, Ordering mechanism of stacked CdSe/ZnS_xSe_1-x quantum dots: A combined reciprocal-space and real-space approach, Phys. Rev. B 72, 195334 (2005). [also selected for Vir. J. Nan. Sci. & Tech. 12 (23), 2005]
  Online (DOI)

• [8]
  J. I. Flege*, Th. Schmidt, J. Bätjer, M. Çakmak, G. Materlik, and J. Falta, Desorption site-specificity and halogen minority sites on Si(111), New J. Phys. 7, 208 (2005).
  Online (DOI)

• [7]
  Th. Schmidt, S. Gangopadhyay, J. I. Flege, T. Clausen, A. Locatelli, S. Heun, and J. Falta, Self-organized 2D nanopatterns after low-coverage Ga adsorption on Si(111), New. J. Phys. 7, 193 (2005).
  Online (DOI)

• [6]
  M. Siebert, Th. Schmidt, J. I. Flege, and J. Falta, Sb-induced reconstructions on Si(113): Adatoms as the key elements, Phys. Rev. B 72, 045323 (2005).
  Online (DOI)

• [5]
  J. I. Flege*, Th. Schmidt, G. Alexe, T. Clausen, S. Bernstorff, I. Randjelovic, V. Aleksandrovic, A. Kornowski, H. Weller, and J. Falta, CoPt₃ nanoparticles adsorbed on SiO₂: a GISAXS and SEM Study, Mat. Res. Soc. Symp. Proc. 840, Q6.10.1 (2005).
  Online (DOI)

• [4]
  M. Siebert, J. I. Flege, Th. Schmidt, and J. Falta, XSW measurements of Sb on the Si(113) surface, Physica B 375, 115 (2005).
  Online (DOI)

2004

• [3]
  J. I. Flege*, Th. Schmidt, G. Materlik and J. Falta, Dry etching characteristics and surface reconstruction of Cl/Si(113), Surf. Sci. 566-568, 94-99 (2004).
  Online (DOI)

• [2]
  J. I. Flege, Th. Schmidt, A. Hille, J. Falta, and G. Materlik, Photon-stimulated Desorption and X-Ray Standing Waves, Synchrotron Radiation News 17, 43-47 (2004).
  Online (DOI)

2002

• [1]
  J. I. Flege*, Th. Schmidt, J. Falta, and G. Materlik, Origin of X-ray photon stimulated desorption of Cl⁺ and Cl²⁺ ions from Cl/Si(111)-(1×1), Surf. Sci. 507-510, 381-388 (2002).
  Online (DOI)

• [M5]
  R. Bodendiek, J. I. Flege, J. Lagemann, R. Rauscher, Hamiltonkreise vom Typ D in verallgemeinerten Petersenschen Graphen P(n, 4), Shaker Verlag, Aachen, 2004.

• [M4]
  R. Bodendiek, J. I. Flege, R. Lang, R. Rauscher, Hamiltonkreise in verallgemeinerten Petersenschen Graphen P(n, 4), Shaker Verlag, Aachen, 2003.

• [M3]
  R. Rauscher, R. Bodendiek, and J. I. Flege, On the Hamiltonicity of a Class of Generalized Petersen Graphs II, Res. Math. 41, 156-195 (2002).

• [M2]
  J. I. Flege, R. Bodendiek, and R. Rauscher, On the Hamiltonicity of a Class of Generalized Petersen Graphs, Res. Math. 41, 68-105 (2002).

• [M1]
  R. Bodendiek, J. I. Flege, and G. Walther, Über Hamiltonkreise in verallgemeinerten Petersengraphen, Mitt. Math. Ges. Hamburg 21/1, 97-124 (2002).