Chair of
Applied physics / sensor technology
Prof. Dr. rer. nat. habil. Dieter Schmeißer
Publications 2008
08_18 Deposition of reactive and non-reactive metals on titanium dioxide - chromium and cobalt S. Müller, D. Schmeißer Students and Young Scientists Workshop "Photonics and Microsystems", 2008 International. S. 53-58. DOI: 10.1109/STYSW.2008.5164143. Online (DOI)
08_17 Application of r.f. plasma ultrashallow nitrogen ion implantation for pedestal oxynitride layer formation T. Bieniek, R.B. Beck, A. Jakubowski, P. Konarski, M. Ćwil, P. Hoffmann, D. Schmeißer Vacuum 82/10 (2008) 1020-1028 Online (DOI)
08_16 Nano-scale analysis using synchrotron-radiation: Applications in the semiconductor industry E. Zschech, H. Geisler, J. Rinderknecht, G. Schneider, R. Spolenak, D. Schmeißer Current Nanoscience 4/3 (2008) 256-266 Online
08_15 Novel Carbon-cage based ultralow-k materials: Modelling and first experiments K. Zagorodniy, D. Chumakov, C. Täschner, A. Lukowiak, H. Stegmann, D. Schmeisser, H. Geisler, H.J. Engelmann, H. Hermann, E. Zschech IEEE Transaction on Semiconductor Manufacturing 21/4 (2008) 646-660 Online (DOI)
08_14 Study of silicon/oxides interfaces by means of Si2O resonant photoemission M. Tallarida, D. Schmeißer Thin Solid Films 517/1 (2008) 447-449 Online (DOI)
08_13 The initial atomic layer deposition of HfO2/Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy M. Tallarida, K. Karavaev, D. Schmeißer Journal of Applied Physics 104 (2008) 064116 Online (DOI)
08_12 Ferroelectric properties of spin-coated ultrathin (down to 10 nm) copolymer films K. Müller, D. Mandal, K. Henkel, I. Paloumpa, D. Schmeißer Applied Physics Letters 93 (2008) 112901 Online (DOI)
08_11 Nanosized superparamagnetic precipitates in cobalt-doped ZnO M. Opel, K.-W. Nielsen, S. Bauer, S.T.B. Goennenwein, J.C. Cezar, D. Schmeißer, J. Simon, W. Mader, R. Gross The European Physical Journal B 63 (2008) 437-444 Online (DOI)
08_10 Properties of Cr deposited on TiO2 thin films S. Müller, D. Schmeißer BESSY annual report 2007, pp. 433-434
08_09 Interface chemistry of high-k PrxAl2-xO3 (x=0-2) dielectrics on TiN for dynamic random access memory applications R. Sohal, G. Lupina, G. Lippert, C. Wenger, O. Seifarth, T. Schroeder, M. Tallarida, D. Schmeißer BESSY annual report 2007, pp. 197-198
08_08 HfO2 ALD-growth studied by in situ photoemission M. Tallarida, K. Karavaev, D. Schmeißer, E. Zschech Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 289-290
08_07 Band gap and electronic structure determination with XAS and UPS of thin Pr-oxide films on Si (111) O. Seifarth, A. Wilke, C. Walczyk, J. Dabrowski, P. Zaumseil, D. Schmeißer, H.-J. Müssig, T. Schroeder Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 285-286
08_06 Al-Oxynitride as a buffer layer for high-k dielectrics K. Henkel, Y. Burkov, M. Bergholz, K. Karavaev, R. Sohal, M. Torche, D. Schmeißer Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 161-162
08_05 Electrical investigations on MFIS structures consisting P[VDF/TrFE] as ferro-electric layer for non-volatile memory applications K. Henkel, D. Mandal, B. Seime, I. Paloumpa, I. Lazareva, K. Müller, P. Müller, D. Schmeißer Proceedings of 15th Workshop on Dielectrics in Microelectronics (2008) 159-160
08_04 Influence of annealing on the structure and stoichiometry of europium-doped titanium dioxide thin films J. Domaradzki, D. Kaczmarek, A. Borkowska, D. Schmeißer, S. Müller, R. Wasielewski, A. Ciszewski, D. Wojcieszak Vacuum 82 (2008) 1007-1012 Online (DOI)
08_03 Soft X-ray emission electron microscopy: chemical state microscopy from interface and bulk A. Zimina, D. R. Batchelor, S. Eisebitt, D. Schmeißer, A. Shulakov, W. Eberhardt Surface and Interface Analysis 40 (2008) 958-960 Online (DOI)
08_02 Al-Oxyxynitride interfacial layer investigations for PrXOY on SiC and Si K. Henkel, K. Karavaev, M. Torche, C. Schwiertz, Y. Burkov, D. Schmeißer Journal of Physics: Conference Series 94 (2008) 012004 Online (DOI)
08_01 Microscopic and spectroscopic characterization of interfaces and dielectric layers for OFET devices K. Müller, Y. Burkov, D. Mandal, K. Henkel, I. Paloumpa, A. Goryachko, D. Schmeißer Physica Status Solidi A 205/3 (2008) 600-611 Online (DOI)
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