BTU overview
Faculty 1
Chair of Applied physics / sensor technology Prof. Dr. rer. nat. habil. Dieter Schmeißer

Publications 2009

  • 09_18
    Localized Gap States in LiCoO2 and Their Influence on the Transport Properties in Li-Ion Batteries
    D. Schmeißer, W. Jaegermann, G. Seibold
    Meeting Abstracts-Electrochemical SocietyMA2009-02(5) (2009)223
    Online
  • 09_17
    Synchrotron radiation spectroscopy studies of ultrathin chromium films on titanium dioxide
    S. Müller, D. Schmeißer
    Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International. S. 64-68. DOI: 10.1109/STYSW.2009.5470300.
    Online (DOI)
  • 09_16
    In situ measurements of the atomic layer deposition of high-k dielectrics by atomic force microscope for advanced microsystems
    K. Kolanek, M. Tallarida, K. Karavaev, D. Schmeißer
    Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International. S. 47-51. DOI: 10.1109/STYSW.2009.5470304.
    Online (DOI)
  • 09_15
    The stability of C60 and its derivatives upon handling in microsystems technologies
    J. Klocek, D. Friedrich, D. Schmeißer, M. Hecker, E. Zschech
    Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International. S. 43-46. DOI: 10.1109/STYSW.2009.5470307.
    Online (DOI)
  • 09_14
    Novel "In-situ2" Approach to Modified ALD Processes for Nano-functional Metal Oxide Films
    M.Tallarida, K. Karavaev, D. Schmeißer
    ECS Transactions 25/4 (2009) 253-261, ISSN 1938-5862
    Online (DOI), ISSN 1938-6737
  • 09_13
    Novel "In-situ2" Approach to Modified ALD Processes for Nano-functional Metal Oxide Films
    M.Tallarida, K. Karavaev, K. Kolanek, D. Schmeißer
    Meeting Abstracts- Electrochemical Society 902 (2009) 2036, ISSN 1091-8213
    Online (DOI)
  • 09_12
    Nachweis von Aerosolen (<1μm) mit Schwingquarzimpedanzspektroskopie
    C. Schwiertz, K. Henkel, S. Blei, R. Heidenreich, D. Schmeißer
    Dresdner Beiträge zur Sensorik Band 39 (2009) 217-220, TUDpress Verlag der Wissenschaften GmbH, Dresden, ISBN: 978-3-941298-44-6
  • 09_11
    Geometry and Microstructure Effect on EM-Induced Copper Interconnect Degradation
    E. Zschech, P.S. Ho, P.S., D. Schmeißer, M.A. Meyer, A.V. Vairagar, G. Schneider, M. Hauschildt, M. Kraatz, V. Sukharev
    IEEE Transactions on Device and Materials Reliability 9/1 (2009) 20-30
    Online (DOI)
  • 09_10
    Dynamical X-ray Microscopy Study of Stress-Induced Voiding in Cu Interconnects
    S. Heim, D. Friedrich, P. Guttmann, S. Rehbein, D. Chumakov, Y. Ritz, G. Schneider, D. Schmeißer, E. Zschech
    AIP conference proceedings 1143 (2009) 20-30
    Online (DOI)
  • 09_09
    In-Situ Studies of ALD Growth of Hafnium Oxide Films
    K. Karavaev, K. Kolanek, M. Tallarida, D. Schmeißer, E. Zschech
    Advanced Engineering Materials 11/4 (2009) 264-268
    Online (DOI)
  • 09_08
    Interface Reactions in Ultrathin Functional Dielectric Films
    D. Schmeißer, K. Henkel, K. Müller, M. Tallarida
    Advanced Engineering Materials 11/4 (2009) 269-274
    Online (DOI)
  • 09_07
    Characterization of oxidic and organic materials with synchrotron radiation based XPS and XAS
    D. Schmeißer, M. Tallarida, K. Henkel, K. Müller, D. Mandal, D. Chumakov, E. Zschech
    Materials Science Poland 27/1 (2009) 141-157
    Online
  • 09_06
    Interface screening and imprint in pol(vinylidene fluoride/trifluoroethylene) ferroelectric field effect transistors
    I. Lazareva, Y. Koval, P. Müller, K. Müller, K. Henkel, D. Schmeißer
    Journal of Applied Physics 105 (2009) 054110
    Online (DOI)
  • 09_05
    Microscopic and spectroscopic characterization of interfaces and dielectric layers for OFET devices
    K. Müller, Y. Burkov, D. Mandal, K. Henkel, I. Paloumpa, A. Goryachko, D. Schmeißer
    In: Christof Wöll (Ed.): Organic Electronics. Structural and Electronic Properties of OFETs,
    WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim, 2009, pp 445-468,
    ISBN: 978-3-527-40810-8
  • 09_04
    HfO2/Si interface formation in atomic layer deposition films: an in situ investigation
    M. Tallarida, K. Karavaev, D. Schmeißer
    Journal of Vacuum Science and Technology B 27/1 (2009) 300-304
    Online (DOI)
  • 09_03
    Electrical investigations on metal/ferroelectric/insulator/semiconductor structures using poly[vinylidene fluoride trifluoroethylene] as ferroelectric layer for organic nonvolatile memory applications
    K. Henkel, I. Lazareva, D. Mandal, I. Paloumpa, K. Müller, Y. Koval, P. Müller, D. Schmeißer
    Journal of Vacuum Science and Technology B 27/1 (2009) 504-507
    Online (DOI)
  • 09_02
    Optimization of the AlON buffer layer for PrXOY/Si stacks
    K. Henkel, Y. Burkov, K. Karavaev, M. Torche, C. Schwiertz, D. Schmeißer
    Journal of Vacuum Science and Technology B 27/1 (2009) 253-257
    Online (DOI)
  • 09_01
    On the band gaps and electronic structure of thin single crystalline praseodymium oxide layers on Si(111)
    O. Seifarth, J. Dabrowski, P. Zaumseil, S. Müller, D. Schmeißer, H.-J. Müssig, T. Schroeder
    Journal of Vacuum Science and Technology B 27/1 (2009) 271-276
    Online (DOI)