Chair of
Applied physics / sensor technology
Prof. Dr. rer. nat. habil. Dieter Schmeißer
Publications 2009
09_18 Localized Gap States in LiCoO2 and Their Influence on the Transport Properties in Li-Ion Batteries D. Schmeißer, W. Jaegermann, G. Seibold Meeting Abstracts-Electrochemical SocietyMA2009-02(5) (2009)223 Online
09_17 Synchrotron radiation spectroscopy studies of ultrathin chromium films on titanium dioxide S. Müller, D. Schmeißer Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International. S. 64-68. DOI: 10.1109/STYSW.2009.5470300. Online (DOI)
09_16 In situ measurements of the atomic layer deposition of high-k dielectrics by atomic force microscope for advanced microsystems K. Kolanek, M. Tallarida, K. Karavaev, D. Schmeißer Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International. S. 47-51. DOI: 10.1109/STYSW.2009.5470304. Online (DOI)
09_15 The stability of C60 and its derivatives upon handling in microsystems technologies J. Klocek, D. Friedrich, D. Schmeißer, M. Hecker, E. Zschech Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International. S. 43-46. DOI: 10.1109/STYSW.2009.5470307. Online (DOI)
09_14 Novel "In-situ2" Approach to Modified ALD Processes for Nano-functional Metal Oxide Films M.Tallarida, K. Karavaev, D. Schmeißer ECS Transactions 25/4 (2009) 253-261, ISSN 1938-5862 Online (DOI), ISSN 1938-6737
09_13 Novel "In-situ2" Approach to Modified ALD Processes for Nano-functional Metal Oxide Films M.Tallarida, K. Karavaev, K. Kolanek, D. Schmeißer Meeting Abstracts- Electrochemical Society 902 (2009) 2036, ISSN 1091-8213 Online (DOI)
09_12 Nachweis von Aerosolen (<1μm) mit Schwingquarzimpedanzspektroskopie C. Schwiertz, K. Henkel, S. Blei, R. Heidenreich, D. Schmeißer Dresdner Beiträge zur Sensorik Band 39 (2009) 217-220, TUDpress Verlag der Wissenschaften GmbH, Dresden, ISBN: 978-3-941298-44-6
09_11 Geometry and Microstructure Effect on EM-Induced Copper Interconnect Degradation E. Zschech, P.S. Ho, P.S., D. Schmeißer, M.A. Meyer, A.V. Vairagar, G. Schneider, M. Hauschildt, M. Kraatz, V. Sukharev IEEE Transactions on Device and Materials Reliability 9/1 (2009) 20-30 Online (DOI)
09_10 Dynamical X-ray Microscopy Study of Stress-Induced Voiding in Cu Interconnects S. Heim, D. Friedrich, P. Guttmann, S. Rehbein, D. Chumakov, Y. Ritz, G. Schneider, D. Schmeißer, E. Zschech AIP conference proceedings 1143 (2009) 20-30 Online (DOI)
09_09 In-Situ Studies of ALD Growth of Hafnium Oxide Films K. Karavaev, K. Kolanek, M. Tallarida, D. Schmeißer, E. Zschech Advanced Engineering Materials 11/4 (2009) 264-268 Online (DOI)
09_08 Interface Reactions in Ultrathin Functional Dielectric Films D. Schmeißer, K. Henkel, K. Müller, M. Tallarida Advanced Engineering Materials 11/4 (2009) 269-274 Online (DOI)
09_07 Characterization of oxidic and organic materials with synchrotron radiation based XPS and XAS D. Schmeißer, M. Tallarida, K. Henkel, K. Müller, D. Mandal, D. Chumakov, E. Zschech Materials Science Poland 27/1 (2009) 141-157 Online
09_06 Interface screening and imprint in pol(vinylidene fluoride/trifluoroethylene) ferroelectric field effect transistors I. Lazareva, Y. Koval, P. Müller, K. Müller, K. Henkel, D. Schmeißer Journal of Applied Physics 105 (2009) 054110 Online (DOI)
09_05 Microscopic and spectroscopic characterization of interfaces and dielectric layers for OFET devices K. Müller, Y. Burkov, D. Mandal, K. Henkel, I. Paloumpa, A. Goryachko, D. Schmeißer In: Christof Wöll (Ed.): Organic Electronics. Structural and Electronic Properties of OFETs, WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim, 2009, pp 445-468, ISBN: 978-3-527-40810-8
09_04 HfO2/Si interface formation in atomic layer deposition films: an in situ investigation M. Tallarida, K. Karavaev, D. Schmeißer Journal of Vacuum Science and Technology B 27/1 (2009) 300-304 Online (DOI)
09_03 Electrical investigations on metal/ferroelectric/insulator/semiconductor structures using poly[vinylidene fluoride trifluoroethylene] as ferroelectric layer for organic nonvolatile memory applications K. Henkel, I. Lazareva, D. Mandal, I. Paloumpa, K. Müller, Y. Koval, P. Müller, D. Schmeißer Journal of Vacuum Science and Technology B 27/1 (2009) 504-507 Online (DOI)
09_02 Optimization of the AlON buffer layer for PrXOY/Si stacks K. Henkel, Y. Burkov, K. Karavaev, M. Torche, C. Schwiertz, D. Schmeißer Journal of Vacuum Science and Technology B 27/1 (2009) 253-257 Online (DOI)
09_01 On the band gaps and electronic structure of thin single crystalline praseodymium oxide layers on Si(111) O. Seifarth, J. Dabrowski, P. Zaumseil, S. Müller, D. Schmeißer, H.-J. Müssig, T. Schroeder Journal of Vacuum Science and Technology B 27/1 (2009) 271-276 Online (DOI)
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