Chair of
Applied physics / sensor technology
Prof. Dr. rer. nat. habil. Dieter Schmeißer
Publications 2006
06_25 Formation of Pedestal Oxynitride Layer by Extremely Shallow Nitrogen Implantation in Planar R.F. Plasma Reactor T. Bieniek, R. Beck, A. Jakubowski, P. Hoffmann, D. Schmeißer, P. Konarski, M. Cwil Meeting Abstracts-Electrochemical Society MA2005-02(13) (2006) 531 Online
06_24 Formation of Pedestal Oxynitride Layer by Extremely Shallow Nitrogen Implantation in Planar R.F. Plasma Reactor T. Bieniek, R. Beck, A. Jakubowski, P. Hoffmann, D. Schmeißer, P. Konarski, M. Cwil ECS Transactions 1/5 (2006) 407-417, ISSN 1938-5862 Online (DOI), ISSN 1938-6737
06_23 Nano-scaled Dielectric Barriers (NanoDieB) for CMOS compatible Si-technologies D. Schmeißer, G. Seibold, J. Reif Forum der Forschung 19 (2006) 131-136, ISSN 0947-6989 Online (pdf)
06_22 Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces R. Sohal, M. Torche, K. Henkel, P. Hoffmann, M. Tallarida, D. Schmeißer Materials Science in Semiconductor Processing 9/6 (2006) 945-948 Online (DOI)
06_21 Silicate formation at the interface of Hf-oxide as a high-k dielectric and Si(001) surfaces D. Schmeißer, E. Zschech Materials Science in Semiconductor Processing 9/6 (2006) 934-939 Online (DOI)
06_20 Resonant photoemission at the Oxygen K edge as a tool to study the eletronic properties of defects at SiO2/Si and SiO2/SiC interfaces M. Tallarida, R. Sohal, D. Schmeißer Superlattices and Microstructures 40/4-6 (2006) 393-398 Online (DOI)
06_19 X-ray absorption and photoemission spectroscopy of 3C- and 4H-SiC M. Tallarida, D. Schmeißer, F. Zheng, F. J. Himpsel Surface Science 600 (2006) 3879-3883 Online (DOI)
06_18 Praseodymium silicate films on Si(100) for gate dielectric applications: physical and electrical characterization G. Lupina, T. Schroeder, J. Dabrowski, C. Wenger, A.U. Mane, H.-J. Müssig, P. Hoffmann, D. Schmeißer Journal of Applied Physics 99/11 (2006) 114109 Online (DOI)
06_17 Metallic Single-Crystal CoSi Nanowires via Chemical Vapor Deposition of Single-Source Precursor A. L. Schmitt, L. Zhu, D. Schmeißer, F.J. Himpsel, S. Jin Journal of Physical Chemistry B 110/37 (2006) 18142-18146 Online (DOI)
06_16 Synthesis and Properties of Single-Crystal FeSi Nanowires A.L. Schmitt, M.J. Bierman, D. Schmeißer, F.J. Himpsel, S. Jin Nano Letters 6/8 (2006) 1617-1621 Online (DOI)
06_15 Noise-induced spatiotemporal patterns in a bistable reaction-diffusion system: Photoelectron emission micrsoscopy experiments and modeling of the CO oxidation reaction on Ir(111) P. Hoffmann, S. Wehner, D. Schmeißer, H.R. Brand, J. Küppers Physical Review E 73 (2006) 056123 Online (DOI)
06_14 Chemical Bonding, Permittivity and Elastic Properties in Locally Modified Organosilicate Glass E. Zschech, H. Stegmann, P. Hoffmann, D. Schmeißer, P. Potapov, H.-J. Engelmann, D. Chumakov, H. Geisler Materials Research Society Symposium Proceedings 914 (2006) F11-03 Online (DOI)
06_13 Silicate Formation at the Interface of high-k dielectrics and Si(001) Surfaces D. Schmeißer, F. Zheng, F. Himpsel, H.-J. Engelmann, E. Zschech Materials Research Society Symposium Proceedings 917 (2006) E10-02 Online (DOI)
06_12 Characterization of Chemical Bonding in Low-K Dielectric Materials for Interconnect Isolation: A XAS and EELS Study P. Hoffmann, D. Schmeißer, F. Himpsel, H.-J. Engelmann, E. Zschech, H. Stegmann, J.D. Denlinger Materials Research Society Symposium Proceedings 914 (2006) F01-08 Online (DOI)
06_11 Pr-O-N Dielectrics for MIS Stacks on Silicon and Silicon Carbide Surfaces K. Henkel, M. Torche, R. Sohal, C. Schwiertz, P. Hoffmann, D. Schmeißer Materials Research Society Symposium Proceedings 911 (2006) B10-11 In: M. Dudley, M.A. Capano, T. Kimoto, A.R. Powell, S. Wang (Eds): "Silicon Carbide 2006-Materials, Processing and Devices", S. 353-358, ISBN: 978-1-55899-867-4 Online (DOI)
06_10 Electron spectroscopy and microscopy on chromium oxide nanowires on templated block copolymers O. Seifarth, D. Schmeißer, R. Krenek, A. Sydorenko, M. Stamm Progress in Solid State Chemistry 34 (2006) 111-119 Online (DOI)
06_09 Microstructure and optical properties of TiO2 thin films prepared by low pressure hot target reactive magnetron sputtering J. Domaradzki, D. Kaczmarek, E.L. Prociow, A. Borkowska, D. Schmeisser, G. Beuckert Thin Solid Films 513 (2006) 269-274 Online (DOI)
06_08 Organic thin film transistors with polymer high-k dielectric insulator K. Müller, I. Paloumpa, K. Henkel, D. Schmeißer Materials Science and Engineering C 26 (2006) 1028-1031 Online (DOI)
06_07 The interaction of Al, Ag, Au and Ti to Pr2O3 thin film dielectrics M. Torche, K. Henkel, D. Schmeißer Materials Science and Engineering C 26 (2006) 1127-1130 Online (DOI)
06_06 Silicate formation at the interface of Pr-oxide as a high-K dielectric and Si(001) surfaces D. Schmeißer, F. Zheng, V. Perez-Dieste, F. J. Himpsel, R. LoNigro, R. G. Toro, G. Malandrino, I. L. Fragalà Materials Science and Engineering C 26 (2006) 1122-1126 Online (DOI)
06_05 Characterization of Nanocrystalline TiO2-HfO2 thin films prepared by low pressure hot target reactive magnetron sputtering J. Domaradzki, D. Kaczmarek, E. L. Prociow, A. Borkowska, R. Kudrawiec, J. Misiewicz, D. Schmeißer, G. Beuckert Surface and Coatings Technology 200 (2006) 6283-6287 Online (DOI)
06_04 The consequences of anisotropic diffusion and noise: PEEM at the CO oxidation reaction on stepped Ir(111) surfaces S. Wehner, P. Hoffmann, D. Schmeißer, H. R. Brand, Jürgen Küppers Chemical Physics Letters 423/1-3 (2006) 39-44 Online (DOI)
06_03 Chemical Bonding in Low-k Dielectric Materials for Interconnect Isolation: Characterization using XAS and EELS D. Schmeißer, P. Hoffmann, F. Zheng, F. Himpsel, H. Stegmann, E. Zschech AIP Conference Proceedings 817 (2006) 117-124, ISBN 0-7354-0310-4 Online (DOI)
06_02 Improvement of nitrogen incorporation into oxynitrides on 4H-SiC(0001) P. Hoffmann, D. Schmeißer Nuclear Instruments and Methods in Physics Research B 246/1 (2006) 85-89 Online (DOI)
06_01 Photo-emission-electron-microscopy for characterization of an operating organic electronic device K. Müller, Y. Burkov, D. Schmeißer Thin Solid Films 495 (2006) 219-223 Online (DOI)
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