Chair of
Applied physics / sensor technology
Prof. Dr. rer. nat. habil. Dieter Schmeißer
Publications 2010
10_17 Localized Gap States in LiCoO2 and their Influence on the Transport Properties in Li-Ion Batteries D. Schmeißer, S. Schmidt, G. Seibold, G. Cherkashinin, W. Jaegermann ECS Transactions 25/35 (2010) 37-45, ISSN 1938-5862 Online (DOI), ISSN 1938-6737
10_16 Atomic layer deposition of HfO2 investigated in situ by means of a noncontact atomic force microscopy K. Kolanek, M. Tallarida, D. Schmeißer Materials Science Poland 28/3 (2010) 731-740 Online
10_15 Determination of interfacial layers in high-k nanomaterials by ADXPS measurements J. Wyrodek, M. Tallarida, M. Weisheit, D. Schmeißer Students and Young Scientists Workshop "Photonics and Microsystems", 2010 International. S. 89-92. DOI: 10.1109/STYSW.2010.5714180. Online (DOI)
10_14 Band alignment of high-k/SiO2/Si stacks incorporating Zr and Al oxides prepared by atomic layer deposition Ł. Starzyk, M. Tallarida, D. Schmeißer Students and Young Scientists Workshop "Photonics and Microsystems", 2010 International. S. 75-78. DOI: 10.1109/STYSW.2010.5714175. Online (DOI)
10_13 Fullerene based materials for ultra-low-k application K. Broczkowska, J. Klocek, D. Friedrich, K. Henkel, K. Kolanek, A. Urbanowicz, D. Schmeißer, M. Miller, E. Zschech Students and Young Scientists Workshop "Photonics and Microsystems", 2010 International. S. 39-43. DOI: 10.1109/STYSW.2010.5714165. Online (DOI)
10_12 Single crystalline Pr2-xYxO3 (x=0-2) dielectrics on Si with tailored electronic and crystallographic structure O. Seifarth, M. A. Schubert, A. Giussani, D. O. Klenov, D. Schmeißer, T. Schroeder Journal of Applied Physics 108 (2010) 103709 Online (DOI)
10_11 Band gap determination of P(VDF-TrFE) copolymer film by electron energy loss spectroscopy D. Mandal, K. Henkel, K. Müller, D. Schmeißer Bulletin of Materials Science 33/4 (2010) 457-461 Online (DOI)
10_10 ALD on high mobility channels: engineering the proper gate stack passivation S. Sioncke, H.C. Lin, C. Adelmann, G. Brammertz, A. Delabie, T. Conard, A. Franquet, M. Caymax, M. Meuris,H. Struyf, S. De Gendt, M. Heyns, C. Fleischmann, K. Temst, A. Vantomme, M. Müller, M. Kolbe, B. Beckhoff, D. Schmeisser, M. Tallarida ECS Transactions 33/2 (2010) 9-23, ISSN 1938-5862 Online (DOI), ISSN 1938-6737
10_09 Local anodic oxidation by atomic force microscopy for nano-Raman strain measurements on silicon-germanium thin films K. Kolanek, P. Hermann, P.T. Dudek, T. Gotszalk, D. Chumakov, M. Weisheit, M. Hecker, E. Zschech Thin Solid Films 518 (2010) 3267-3272 Online (DOI)
10_08 Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films A. Tamm, M. Kemell, J. Kozlova, T. Sajavaara, M. Tallarida, K. Kukli, V. Sammelselg, M. Ritala, M. Leskelä Journal of The Electrochemical Society 157 (2010) G193-G201 Online (DOI)
10_07 Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1'-methyl-ruthenocene K. Kukli, J. Aarik, A. Aidla, T. Uustare, I. Jogi, J. Lu, M. Tallarida, M. Kemell A.A. Kiisler, M. Ritala, M. Leskela Journal of Crystal Growth 312 (2010) 2025-2032 Online (DOI)
10_06 In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope K. Kolanek, M. Tallarida, K. Karavaev, D. Schmeißer Thin Solid Films 518 (2010) 4688-4691 Online (DOI)
10_05 Scaling effects on microstructure and reliability for Cu interconnects P. S. Ho, E. Zschech, D. Schmeißer, M. A. Meyer, R. Huebner, M. Hauschildt, L. Zhang. M. Gall, M. Kraatz International Journal Materials Research 101/2 (2010) 216-227 Online (DOI)
10_04 Optimization of MFIS structures containing poly(vinylidene-fluoride trifluoroethylene) for non-volatile memory applications K. Henkel, B. Seime, I. Paloumpa, K. Müller, D. Schmeißer Materials Science Poland 28/1 (2010) 117-128 Online
10_03 Stochastic aspects of pattern formation during the catalytic oxidation of CO on Pd(111) surfaces S. Wehner, S. Karpitschka, Y. Burkov, D. Schmeißer, J. Küppers, H. R. Brand Physica D 239 (2010) 746-751 Online (DOI)
10_02 Buffer layer investigations on MFIS capacitors consisting of ferroelectric poly[vinylidene fluoride trifluoroethylene] K. Henkel, B. Seime, I. Paloumpa, K. Müller, D. Schmeißer IOP conference series: Materials Science and Engineering 8 (2010) 012036 Online (DOI)
10_01 The band gap and band offset in ultrathin oxide-semiconductor heterostructures D. Schmeißer, K. Henkel, M. Bergholz, M. Tallarida Superlattices and Microstructures 47 (2010) 369-376 Online (DOI)
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