Chair of
Applied physics / sensor technology
Prof. Dr. rer. nat. habil. Dieter Schmeißer
Publications 2016
16_18 Depicting the Electronic Structure of HfO2 Films by Spectroscopic Techniques S. Alberton Corrêa, S. Brizzi, D. Schmeisser ECS Transactions 75/6 (2016) 145-153 Online (DOI)
16_17 Sacrificial Self-Assembled Monolayers for the Passivation of GaAs(100) Surfaces and Interfaces D. Cuypers, C. Fleischmann, D.H. van Dorp, S. Brizzi, M. Tallarida, M. Müller, P. Hönicke, A.Billen, R. Chintala, T. Conard, D. Schmeißer, W. Vandervorst, S. Van Elshocht, S. Armini, S. De Gendt, C. Adelmann Chemistry of Materials 28 (2016) 5689-5701 Online (DOI)
16_16 Room-Temperature Atomic Layer Deposition of Al2O3: Impact on Efficiency, Stability and Surface Properties in Perovskite Solar Cells M. Kot, C. Das, Z. Wang, K. Henkel, Z. Rouissi, K. Wojciechowski, H. J. Snaith, D. Schmeisser ChemSusChem 9 (2016) 3401-3406 Online (DOI)
16_15 Yb3+ Assisted Self-Polarized PVDF based Ferroelectretic Nanogenerator: A Facile Strategy of Highly Efficient Mechanical Energy Harvester Fabrication S.K. Ghosh, A. Biswas, S. Sen, C. Das, K. Henkel, D. Schmeisser, D. Mandal Nano Energy 30 (2016) 621-629 Online (DOI)
16_14 A spectroscopic comparison of IGZO thin film and the parent In2O3, Ga2O3, and ZnO single crystals J. Haeberle, S. Brizzi, D. Gaspar, P. Barquinha, Z. Galazka, D. Schulz, D. Schmeißer Materials Research Express 3 (2016) 106302 Online (DOI)
16_13 The Cu2p-edge of superconducting BiSrCu-Oxides studied by resonant Photoelectron Spectroscopy D. Schmeißer, C. Janowitz Synchrotron Radiation in Natural Science: Bulletin of the Polish Synchrotron Radiation Society 15/1-2 (2016) 35. ISSN 1644-7190
16_12 Atomic layer deposition of Al2O3 on CH3NH3PbI3 for enhancement of perovskite solar cells stability M. Sowinska, C. Das, K. Wojciechowski, Z. Rouissi, H. J. Snaith, D. Schmeisser Synchrotron Radiation in Natural Science: Bulletin of the Polish Synchrotron Radiation Society 15/1-2 (2016) 33. ISSN 1644-7190
16_11 Gap states in the Electronic Structure of SnO2 single crystals and amorphous SnOx thin films J. Haeberle, S. Machulik, C. Janowitz, R. Manzke, D. Gaspar, P. Barquinha, D. Schmeißer Journal of Applied Physics 120 (2016) 105101 Online (DOI)
16_10 Engineering of Sub-Nanometer SiOx Thickness in Si Photocathodes for Optimized Open Circuit Potential C. Das, M. Kot, K. Henkel, D. Schmeisser ChemSusChem 9 (2016) 2332-2336 Online (DOI)
16_09 Cerium(III) Complex Modified Gold Electrode: An Efficient Electrocatalyst for the Oxygen Evolution Reaction S. Garain, K. Barman, T. Sinha, S. Jasimuddin, J. Haeberle, K. Henkel, D. Schmeisser, D. Mandal ACS Applied Materials & Interfaces 8 (2016) 21294-21301 Online (DOI)
16_08 Electronic properties of atomic layer deposited films, anatase and rutile TiO2 studied by resonant photoemission spectroscopy C. Das, M. Richter, M. Tallarida, D. Schmeißer Journal of Physics D: Applied Physics 49 (2016) 275304 Online (DOI)
16_07 Analysis of nitrogen species in titanium oxynitride ALD films M. Sowinska, S. Brizzi, C. Das, I. Kärkkänen, J. Schneidewind, F. Naumann, H. Gargouri, K. Henkel, D. Schmeißer Applied Surface Science 381 (2016) 42-47 Online (DOI)
16_06 A model for statistical electromigration simulation with dependence on capping layer and Cu microstructure in two dimensions M. Kraatz, M. Gall, E. Zschech, D. Schmeisser, P. S. Ho Computational Materials Science 120 (2016) 29-35 Online (DOI)
16_05 On the structural composition and stability of Fe–N–C catalysts prepared by an intermediate acid leaching U. I. Kramm, A. Zana, T. Vosch, S. Fiechter, M. Arenz, D. Schmeißer Journal of Solid State Electrochemistry 20 (2016) 969–981 Online (DOI)
16_04 Intrinsic localized gap states in IGZO and its parent single crystalline TCOs D. Schmeißer, J. Haeberle Thin Solid Films 603 (2016) 206-211 Online (DOI)
16_03 Influence of CO annealing in metal-oxide-semiconductor capacitors with SiO2 films thermally grown on Si and on SiC E. Pitthan, R. dos Reis, S. Alberton Corrêa, D. Schmeisser, H. Boudinov, F. Chiarello Stedile Journal of Applied Physics 119 (2016) 025307 Online (DOI)
16_02 Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study M. Sowińska, K. Henkel, D. Schmeißer, I. Kärkkänen, J. Schneidewind, F. Naumann, B. Gruska, H. Gargouri Journal of Vacuum Science and Technology A 34 (2016) 01A127 Online (DOI)
16_01 Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO2 films S. Alberton Corrêa, S. Brizzi, D. Schmeisser Journal of Vacuum Science and Technology A 34 (2016) 01A117 Online(DOI)
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