ex-situ ALD system
System for atomic layer deposition (ALD) on larger sample sizes (uo to ⌀=5 cm)
ex-situ ALD reactor (Foto: Karsten Henkel)
ALD valves (Foto: Karsten Henkel)
LabVIEW-cotrolled ex-situ ALD-Reactor (Foto: Karsten Henkel)
Wiring of the control unit (Foto: Karsten Henkel)
ALD Reactor
- UHV compatible stainless steel chamber
- Heatable sample holder (up to 1000°C) with SiN heater
- Pump- or flow-type mode of ALD
- Gas mixing and supply:
- VCR-based
- 3 main lines contrpolled via mass flow controllers (Bronkhorst)
- 3 precursor lines (for high, medium, and low vapor pressure)
- 3 oxidant/reactant lines (H2O, O3/O2...)
- 1 purge line (N2)
- Lines heatable up to 120°C
- Pneumatic ALD valves
- Ozon generator (Oxidation Technologies)
- Control software: Lab-View