ex-situ ALD system

System for atomic layer deposition (ALD) on larger sample sizes (uo to ⌀=5 cm)

ALD Reactor

  • UHV compatible stainless steel chamber
  • Heatable sample holder (up to 1000°C) with SiN heater
  • Pump- or flow-type mode of ALD
  • Gas mixing and supply:
    • VCR-based
    • 3 main lines contrpolled via mass flow controllers (Bronkhorst)
      • 3 precursor lines (for high, medium, and low vapor pressure)
      • 3 oxidant/reactant lines (H2O, O3/O2...)
      • 1 purge line (N2)
      • Lines heatable up to 120°C
    • Pneumatic ALD valves
  • Ozon generator (Oxidation Technologies)
  • Control software: Lab-View