Publikationen in Zeitschriften
80. | “Lithium-ion batteries: direct solid sampling for characterisation of black mass recyclates using graphite furnace atomic absorption spectrometry” M. Dommaschk, T. Sieber, J. Acker J. Anal. At. Spectrom., 39 (2024) 2522–2531 |
79. | “Silicon-28-Tetrafluoride as an Educt of Isotope-Engineered Silicon Compounds and Bulk Materials for Quantum Systems” O.C. Ernst, D. Uebel, R. Brendler, K. Kraushaar, M. Steudel, J. Acker, E. Kroke Molecules, 29 (2024) 4222 |
78. | “Kinetic studies on acidic wet chemical etching of silicon in binary and ternary mixtures of HF, HNO3 and H2SiF6” A. Rietig, J. Acker Phys. Chem. Chem. Phys., 25 (2023) 26245–26257 |
77. | “About Determining Reliable Etching Rates and the Role of Temperature in Kinetic Experiments on Acidic Wet Chemical Etching of Silicon” A. Rietig, T. Langner, J. Acker Phys. Chem. Chem. Phys., 25 (2023) 11387-11397 |
76. | “A Phenomenological and Quantitative View on the Degradation of Positive Electrodes from Spent Lithium-ion Batteries in Humid Atmosphere” T. Langner, T. Sieber, A. Rietig, V. Merk, L. Pfeifer, J. Acker Sci Rep 13, 5671 (2023) |
75. | “Comprehensive stoichiometric studies on the reaction of silicon in HF-HNO3 and HF-HNO3-H2SiF6 mixtures” A. Rietig, T. Langner, J. Acker Phys. Chem. Chem. Phys., 24 (2022) 3094-3108 |
74. | “New insights into boron species in acidic digestion solutions of boron-doped silicon” A. Rietig, H.-J. Grafe, J. Acker J. Anal. At. Spectrom. 36 (2021) 2492-2500 |
73. | “Strain enhanced chemical oxidation of silicon wafer” S. Herold, J. Acker Materials Science in Semiconductor Processing 135 (2021) 106105 |
72. | “The Role of Molecular Hydrogen Formation in the Process of Metal-Ion Reduction on Multi-Crystalline Silicon in a Hydrofluoric Acid Matrix” S. Schönekerl, J. Acker Nanomaterials 11 (2021) 982 |
71. | “Studies on the deposition of copper in lithium-ion batteries during the deep discharge process” T. Langner, T. Sieber, J. Acker Sci Rep 11, 6316 (2021) |
70. | “Lattice strain enhanced acidic etching on as cut sawn silicon wafer” S. Herold, J. Acker Materials Science in Semiconductor Processing 123 (2021) 105575 |
69. | “The Kinetics and Stoichiometry of Metal Cation Reduction on Multi-Crystalline Silicon in a Dilute Hydrofluoric Acid Matrix” S. Schönekerl, J. Acker Nanomaterials 10 (2020) 2545 |
68. | “Raman spectroscopic determination of the degree of dissociation in binary and ternary mixtures with HF and H2SiF6” T. Langner, A. Rietig, J. Acker J Raman Spectrosc., 51 (2020) 366-372 |
67. | “A revised model of silicon oxidation during the dissolution of silicon in HF/HNO3 mixtures” A. Rietig, T. Langner, J. Acker Phys. Chem. Chem. Phys., 21 (2019) 22002-22013 |
66. | “A two-step acidic texturization procedure for the manufacture of low-reflective multi-crystalline silicon solar wafer” B. Meinel, T. Langner, P. Preis, T. Sieber, E. Wefringhaus, J. Acker Solar Energy 193 (2019) 395–402 |
65. | “Measurement of the temperature dependence of lattice deformations in silicon using Raman microscopy” S. Herold, J. Acker J. Appl. Phys. 126, (2019) 035103 |
64. | “Electroless deposited platinum antennas for wireless surface acoustic wave sensors” E. Brachmann, M. Seifert, N. Neumann, N. Alshwawreh, M. Uhlemann, S. Menzel, J. Acker, S. Herold, V. Hoffmann, T. Gemming Materials 12 (2019) 1002-1014 |
63. | “Recovery of Li(Ni0.33Mn0.33Co0.33)O2 from Lithium-Ion Battery Cathodes: Aspects of Degradation” T. Sieber, J. Ducke, A. Rietig, T. Langner, J. Acker Nanomaterials 9(2), (2019) 246-259 |
62. | “Etching shapes the topography of silicon wafers: Lattice-strain enhanced chemical reactivity of silicon for efficient solar cells” T. Langner, T. Sieber, J. Acker ACS Appl. Nano Mater. 1 (2018) 4135-4144 |
61. | “Saw damage as an etch mask for the acidic texturization of multicrystalline silicon wafers” J. Acker, T. Langner, B. Meinel, T. Sieber Mat. Sci. Semicond. Proc. 74 (2018) 238-248 |
60. | “Development and validation of a new method for the precise and accurate determination of trace elements in silicon by ICP-OES in high silicon matrices” A. Rietig, J. Acker J. Anal. At. Spectrom. 32 (2017) 322-333 |
59. | “Chemical etching of Tungsten thin films for high-temperature surface acoustic wave-based sensor devices” M. Spindler, S. Herold, J. Acker, E. Brachmann, S. Oswalda, S. Menzel, G. Rane, V. Hoffmann Thin Solid Films 612 (2016) 322–326 |
58. | “Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C2H2/N2O flame” J. Acker, S. Bücker, V. Hoffmann J. Anal. At. Spectrom. 31 (2016) 902-911 |
57. | "NMR investigation of boron impurities in refined metallurgical grade silicon" H.-J. Grafe, W. Löser, S. Schmitz, M. Sakaliyska, S. Wurmehl, S. Eisert, B. Reichenbach, J. Acker, A. Rietig, J. Ducke, T. Müller Phys. Status Solidi A 212, No. 9 (2015) 2031–2036 |
56. | "The texturisation process during horizontal acidic etching of multi-crystalline silicon wafer" B. Meinel, T. Koschwitz, R. Heinemann, J. Acker Mat. Sci. Semicond. Proc. 26 (2014) 695-703 |
55. | "Determination of fluorine by molecular absorption spectrometry of AlF using a high-resolution continuum source spectrometer and a C2H2/N2O flame" S. Bücker, V. Hoffmann, J. Acker Current Analytical Chemistry 10 (2014) 426 - 434 |
54. | "The Formation of AlF Molecules and Al Atoms in a C2H2/N2O Flame Studied by Absorption and Emission Spectrometry of Molecules and Atoms" J. Acker, S. Bücker, V. Hoffmann Current Analytical Chemistry 10 (2014) 418-425 |
53. | "Comparison of diamond wire cut and silicon carbide slurry processed silicon wafer surfaces after acidic texturization" B. Meinel, T. Koschwitz, C. Blocks, J. Acker Materials Science in Semiconductor Processing 26 (2014) 93-100 |
52. | "HF/HNO3 etching of the saw damage" J. Acker, T. Koschwitz, B. Meinel, R. Heinemann, C. Blocks Energy Procedia 38 (2013) 223-233 |
51. | "Application of confocal microscopy to evaluate the morphology of acidic etched mc-silicon" T. Koschwitz, B. Meinel, J. Acker Energy Procedia 38 (2013) 234-242 |
50. | "Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO3 Mixtures" J. Acker, A. Rietig, M. Steinert, V. Hoffmann J. Phys. Chem. C 116 (2012) 20380-20388 |
49. | "Textural development of SiC and diamond wire sawed sc-silicon wafer" B. Meinel, T. Koschwitz, J. Acker Energy Procedia 27 (2012) 330-336 |
48. | "Spectrometric analysis of process etching solutions of the photovoltaic industry - Determination of HNO3, HF, and H2SiF6 using high-resolution continuum source absorption spectrometry of diatomic molecules and atoms" S. Bücker, J. Acker Talanta 94 (2012) 335-341 |
47. | "Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry (DC-GD-OES)" V. Hoffmann, M. Steinert, J. Acker J. Anal. At. Spectrom. 26 (2011) 1990-1996. |
46. | "Influence of incorporated non-metallic impurities on electromigration in copper damascene interconnect lines" M. Stangl, M. Lipták, J. Acker, V. Hoffmann, S. Baunack, K. Wetzig Thin Solid Films 517 (2009) 2687-2690 |
45. | "New aspects on the reduction of nitric acid during wet chemical etching of silicon in concentrated HF/HNO3-mixtures" M. Steinert, J. Acker, K. Wetzig J. Phys. Chem. C 112 (2008) 14139-14144 |
44. | "Experimental and thermodynamic assessment of the Nb-Ni-Y system" N. Mattern, M. Zinkevich, W. Löser, G. Behr, J. Acker J. Phase Equilib. Diffus. 29 (2008) 141-155 |
43. | "Thermodynamic assessment of the copper catalyzed direct synthesis of methylchlorosilanes" J. Acker, K. Bohmhammel J. Organomet. Chem. 693 (2008) 2483-2493 |
42. | "Critical aspects on preparation of Bi-2223 glassy precursor by melt-process" A. Nilsson, W. Gruner, J. Acker, K. Wetzig J. Non-Cryst. Solids 354 (2008) 839-847 |
41. | "Structural behavior of CuxZr100-x metallic glass (x = 35-70)" N. Mattern, A. Schöps, U. Kühn, J. Acker, O. Khvostikova, J. Eckert J. Non-Cryst. Solids 354 (2008) 1054-1060 |
40. | "Influence of initial microstructure and impurities on Cu room-temperature recrystallization (self-annealing)" M. Stangl, M. Liptak, A. Fletcher J. Acker, J. Thomas, H Wendrock, S. Oswald, K. Wetzig Microelectronic Engineering 85 (2008) 534-541 |
39. | "Influence of Ta-based diffusion barriers on the microstructure of copper thin films" M. Stangl, A. Fletcher J. Acker, H Wendrock, S. Oswald, K. Wetzig J. Electronic Materials 36 (2007) 1625-1629 |
38. | "Glass-ceramic route of BSCCO superconductors - Fabrication of amorphous precursor" A. Nilsson, W. Gruner, J. Acker, K. Wetzig Physica C 460-462 (2007) 1331-1332 |
37. | "Purification-induced sidewall functionalization of magnetically pure single-walled carbon nanotubes" R. Schönfelder, M.H. Rümmeli, W. Gruner, M. Löffler, J. Acker, V. Hoffmann, T. Gemming, B. Büchner, T. Pichler Nanotechnology 18 (2007) 375601 |
36. | "Chemical analysis of acidic silicon etch solutions II: Determination of HNO3, HF, and H2SiF6 by ion chromatography" J. Acker, A. Henßge Talanta 72 (2007) 1540-1545 |
35. | "Chemical analysis of acidic silicon etch solutions I: Titrimetric determination of HNO3, HF, and H2SiF6" A. Henßge, J. Acker Talanta 73 (2007) 220-226 |
34. | "Phase formation of rapidly quenched Cu-Si alloys" N. Mattern, R. Seyrich, L. Wilde, C. Baehtz, M. Knapp, J. Acker J. Alloys Comp. 429 (2007) 211-215 |
33. | "Determination of fluoride in HNO3/ HF/ H2SiF6 etch solutions by new potentiometric titration methods" W. Weinreich, J. Acker, I. Gräber Talanta 71 (2007) 1901-1905 |
32. | "Study on the mechanism of silicon etching in HNO3-rich HF/HNO3 mixtures" M. Steinert, J. Acker, S. Oswald, K. Wetzig J. Phys. Chem. C, 111 (2007) 2133-2140 |
31. | "Determination of manganese valency in La1-xSrxMnO3 using ELNES in the (S)TEM" T. Riedl, T. Gemming, W. Gruner, J. Acker, K. Wetzig Micron 38 (2007) 224-230 |
30. | "Incorporation of sulfur, chlorine, and carbon into electroplated copper thin films" M. Stangl, J. Acker, S. Oswald, M. Uhlemann, T. Gemming, S. Baunack, K. Wetzig Microelectronic Engineering 84 (2007) 54-59 |
29. | "Segregation of organic impurities in thin electroplated Cu metallizations" M. Stangl, J. Acker, V. Hoffmann, W. Gruner, K. Wetzig Microchim. Acta, 156 (2007) 159-162 |
28. | "Sulfur incorporation in electroplated Cu(Ag) thin films" S. Strehle, R. Reiche, V. Hoffmann, J. Acker, S. Menzel, T. Gemming, K. Wetzig Microchim. Acta 156 (2006) 167-172 |
27. | "Tailoring the microstructure and mechanical properties of Ti-Al alloy using a novel electromagnetic stirring method" K. Biswas, R. Hermann, J. Das, J. Priede, G. Gerbeth, J. Acker Scripta Materialia 55 (2006) 1143-1146 |
26. | "Influence of melt convection on microstructure evolution of Nd-Fe-B alloys using forced cruicible rotation technique" K. Biswas, R. Hermann, O. Filip, J. Acker, G. Gerbeth, J. Priede Phys. Stat. Sol. C 3 (2006) 3277-3280 |
25. | "The effect of H2SiF6 on the surface morphology of textured multi-crystalline silicon" W. Weinreich, J. Acker, I. Gräber Semicond. Sci. Technol. 21 (2006) 1278-1286 |
24. | "Reactive species generated during wet chemical etching of silicon in HF / HNO3 mixtures" M. Steinert, J. Acker, M. Krause, S. Oswald, K. Wetzig J. Phys. Chem. B 110 (2006) 11377-11382 |
23. | "Structural effects on Zr substitution in the 1:7- and 2:17-type structure" L. Schramm, J. Acker, K. Wetzig J. Alloys. Comp. 414 (2006) 158-168 |
22. | "Titrimetric determination of silicon dissolved in concentrated HF-HNO3 etching solutions" A. Henßge, J. Acker, C. Müller Talanta 68 (2006) 581-585 |
21. | "Methods for the precise determination of the chemical composition of NaxCoO2 superconductors" J. Acker, G. Krabbes Analytical and Bioanalytical Chemistry 383 (2005) 1075-1081 |
20. | "Experimental studies on the mechanism of wet chemical etching of silicon in HF/HNO3 mixtures" M. Steinert, J. Acker, A. Henßge, K. Wetzig Journal of the Electrochemical Society 152 (2005) C843-C850 |
19. | "Characterization of electroplated copper self-annealing with investigations focused on incorporated impurities" M. Stangl, J. Acker, V. Dittel, W. Gruner, V. Hoffmann, K. Wetzig Microelectronic Engineering 82 (2005) 189-195 |
18. | "Investigation of organic impurities adsorbed on and incorporated into electroplated copper layers" M. Stangl, V. Dittel, J. Acker, V. Hoffmann, W. Gruner, K. Wetzig Appl. Surf. Sci. 252 (2005) 158-161 |
17. | "Verhalten organischer Verunreinigungen in elektrochemisch abgeschiedenen Kupfermetallisierungsschichten während des self-annealings bei Raumtemperatur" M. Stangl, J. Acker, V. Dittel, W. Gruner, V. Hoffmann, S. Oswald, K. Wetzig Galvanotechnik 96 (2005) 1576-1579 |
16. | "Untersuchungen zum Einbau von Additiven in elektrochemisch abgeschiedenen Kupferschichten" M. Stangl, J. Acker, A. Henßge, W. Gruner, V. Hoffmann, H. Wendrock, K. Wetzig Galvanotechnik 96 (2005) 1084-1087 |
15. | "Stoichiometry dependence of superconductivity and microstructure in mechanically alloyed MgB2" O. Perner, J. Eckert, W. Häßler, C. Fischer, J. Acker, T. Gemming, G. Fuchs, B. Holzapfel, L. Schultz J. Appl. Phys. 97 (2005) 056105 |
14. | "Thermo-mechanical behavior and microstructural evolution of electrochemically deposited low-alloyed CuAg thin films" S. Strehle, S. Menzel, H. Wendrock, J. Acker, T. Gemming, K. Wetzig Microelectronic Engineering 76 (2004) 205-211 |
13. | Influence of nitrogen content on the crystallization behavior of thin Ta-Si-N diffusion barriers" R. Hübner, M. Hecker, N. Mattern, A. Voss, J. Acker, V. Hoffmann, K. Wetzig, H.-J. Engelmann, E. Zschech, H. Heuer, Ch. Wenzel Thin Solid Films 468 (2004) 183-192 |
12. | "The reactivity in the system Cu-Si-Cl related to the activation of silicon in the Direct Synthesis" J. Acker, S. Köther, K.M. Lewis, K. Bohmhammel Silicon Chemistry 2 (2003) 195-206 |
11. | "Compensation effect in trichlorosilane synthesis" J. Acker, K. Bohmhammel J. Organomet. Chem. 686 (2003) 151-157 |
10. | "Microstructural investigation of electrodeposited CuAg-thin films" S. Strehle, S. Menzel, H. Wendrock, J. Acker, K. Wetzig Microelectronic Engineering 70 (2003) 506-511 |
9. | Study of the (001) cleavage planes of guanidinium methane sulfonate crystals by AFM and He diffraction" G. Bracco, Y. Hu, J. Acker, M.D. Ward Appl. Surf. Sci. 212 (2003) 151-156 |
8. | "He diffraction study of organic single-crystal surfaces: Hydrogen-bonded and methyl-terminated (001) cleavage planes of a guanidinium methane sulfonate crystal" G. Bracco, J. Acker, M.D. Ward, G. Scoles Langmuir 18 (2002) 5551-5557 |
7. | "Reactivity of intermetallic compounds: A solid state approach to direct reactions of silicon" J. Acker, K. Bohmhammel J. Phys. Chem. B 106 (2002) 5105-5117 |
6. | "Synthesis of nanocrystalline silicon in the system La-Si-H-Cl: Thermoanalytical investigations" E. Henneberg, J. Acker, I. Röver, G. Roewer, K. Bohmhammel Thermochim. Acta 382 (2002) 297-301 |
5. | "Formation of transition metal silicides by solid-gas reactions: Thermodynamic and kinetic considerations" J. Acker, I. Röver, R. Otto, G. Roewer, K. Bohmhammel Solid State Ionics 141-142 (2001) 583-591 |
4. | "Synthesis of silicon nanoclusters by solid-gas reaction" J. Acker, K. Bohmhammel, E. Henneberg, G. Irmer, I. Röver, G. Roewer Adv. Mater. 12 (2000) 1605-1610 |
3. | "Optimization of thermodynamic data in the Ni-Si system" J. Acker, K. Bohmhammel Thermochimica Acta 337 (1999) 187-193 |
2. | "Thermodynamic properties of the nickel silicide NiSi between 8 and 400 K" J. Acker, G.J.K. van den Berg, K. Bohmhammel, Ch. Kloc, J.C. van Miltenburg Thermochimica Acta 339 (1999) 29-33 |
1. | "Thermodynamic properties of iron silicides FeSi and alpha- FeSi2" J. Acker, G.J.K. van den Berg, K. Bohmhammel, Ch. Kloc, J.C. van Miltenburg J. Chem. Thermodynamics 31 (1999) 1523-1536 |