Veröffentlichungen 2016

  • 16_18
    Depicting the Electronic Structure of HfO2 Films by Spectroscopic Techniques
    S. Alberton Corrêa, S. Brizzi, D. Schmeisser
    ECS Transactions 75/6 (2016) 145-153
    Online (DOI)
  • 16_17
    Sacrificial Self-Assembled Monolayers for the Passivation of GaAs(100) Surfaces and Interfaces
    D. Cuypers, C. Fleischmann, D.H. van Dorp, S. Brizzi, M. Tallarida, M. Müller, P. Hönicke, A.Billen, R. Chintala, T. Conard, D. Schmeißer, W. Vandervorst, S. Van Elshocht, S. Armini, S. De Gendt, C. Adelmann
    Chemistry of Materials 28 (2016) 5689-5701
    Online (DOI)
  • 16_16
    Room-Temperature Atomic Layer Deposition of Al2O3: Impact on Efficiency, Stability and Surface Properties in Perovskite Solar Cells
    M. Kot, C. Das, Z. Wang, K. Henkel, Z. Rouissi, K. Wojciechowski, H. J. Snaith, D. Schmeisser
    ChemSusChem 9 (2016) 3401-3406
    Online (DOI)
  • 16_15
    Yb3+ Assisted Self-Polarized PVDF based Ferroelectretic Nanogenerator: A Facile Strategy of Highly Efficient Mechanical Energy Harvester Fabrication
    S.K. Ghosh, A. Biswas, S. Sen, C. Das, K. Henkel, D. Schmeisser, D. Mandal
    Nano Energy 30 (2016) 621-629
    Online (DOI)
  • 16_14
    A spectroscopic comparison of IGZO thin film and the parent In2O3, Ga2O3, and ZnO single crystals
    J. Haeberle, S. Brizzi, D. Gaspar, P. Barquinha, Z. Galazka, D. Schulz, D. Schmeißer
    Materials Research Express 3 (2016) 106302
    Online (DOI)
  • 16_13  
    The Cu2p-edge of superconducting BiSrCu-Oxides studied by resonant Photoelectron Spectroscopy
    D. Schmeißer, C. Janowitz
    Synchrotron Radiation in Natural Science: Bulletin of the Polish Synchrotron Radiation Society 15/1-2 (2016) 35. ISSN 1644-7190
  • 16_12
    Atomic layer deposition of Al2O3 on CH3NH3PbI3 for enhancement of perovskite solar cells stability
    M. Sowinska, C. Das, K. Wojciechowski, Z. Rouissi, H. J. Snaith, D. Schmeisser
    Synchrotron Radiation in Natural Science: Bulletin of the Polish Synchrotron Radiation Society 15/1-2 (2016) 33. ISSN 1644-7190
  • 16_11
    Gap states in the Electronic Structure of SnO2 single crystals and amorphous SnOx thin films
    J. Haeberle, S. Machulik, C. Janowitz, R. Manzke, D. Gaspar, P. Barquinha, D. Schmeißer
    Journal of Applied Physics 120 (2016) 105101
    Online (DOI)
  • 16_10
    Engineering of Sub-Nanometer SiOx Thickness in Si Photocathodes for Optimized Open Circuit Potential
    C. Das, M. Kot, K. Henkel, D. Schmeisser
    ChemSusChem 9 (2016) 2332-2336
    Online (DOI)
  • 16_09
    Cerium(III) Complex Modified Gold Electrode: An Efficient Electrocatalyst for the Oxygen Evolution Reaction
    S. Garain, K. Barman, T. Sinha, S. Jasimuddin, J. Haeberle, K. Henkel, D. Schmeisser, D. Mandal
    ACS Applied Materials & Interfaces 8 (2016) 21294-21301
    Online (DOI)
  • 16_08
    Electronic properties of atomic layer deposited films, anatase and rutile TiO2 studied by resonant photoemission spectroscopy
    C. Das, M. Richter, M. Tallarida, D. Schmeißer
    Journal of Physics D: Applied Physics 49 (2016) 275304
    Online (DOI)
  • 16_07
    Analysis of nitrogen species in titanium oxynitride ALD films
    M. Sowinska, S. Brizzi, C. Das, I. Kärkkänen, J. Schneidewind, F. Naumann, H. Gargouri, K. Henkel, D. Schmeißer
    Applied Surface Science 381 (2016) 42-47
    Online (DOI)
  • 16_06
    A model for statistical electromigration simulation with dependence on capping layer and Cu microstructure in two dimensions
    M. Kraatz, M. Gall, E. Zschech, D. Schmeisser, P. S. Ho
    Computational Materials Science 120 (2016) 29-35
    Online (DOI)

  • 16_05
    On the structural composition and stability of Fe–N–C catalysts prepared by an intermediate acid leaching
    U. I. Kramm, A. Zana, T. Vosch, S. Fiechter, M. Arenz, D. Schmeißer
    Journal of Solid State Electrochemistry 20 (2016) 969–981
    Online (DOI)
  • 16_04
    Intrinsic localized gap states in IGZO and its parent single crystalline TCOs
    D. Schmeißer, J. Haeberle
    Thin Solid Films 603 (2016) 206-211
    Online (DOI)

  • 16_03
    Influence of CO annealing in metal-oxide-semiconductor capacitors with SiO2 films thermally grown on Si and on SiC
    E. Pitthan, R. dos Reis, S. Alberton Corrêa, D. Schmeisser, H. Boudinov, F. Chiarello Stedile
    Journal of Applied Physics 119 (2016) 025307
    Online (DOI)

  • 16_02
    Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
    M. Sowińska, K. Henkel, D. Schmeißer, I. Kärkkänen, J. Schneidewind, F. Naumann, B. Gruska, H. Gargouri
    Journal of Vacuum Science and Technology A 34 (2016) 01A127
    Online (DOI)

  • 16_01
    Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO2 films
    S. Alberton Corrêa, S. Brizzi, D. Schmeisser
    Journal of Vacuum Science and Technology A 34 (2016) 01A117
    Online(DOI)